Vacuum compatible, high-speed, 2-D mirror tilt stage

Denham,; Paul, E

Title: Vacuum compatible, high-speed, 2-D mirror tilt stage

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Abstract

A compact and vacuum compatible magnetic-coil driven tiltable stage that is equipped with a high efficiency reflective coating can be employed as a scanner in EUV applications. The drive electronics for the scanner is fully in situ programmable and rapidly switchable.

Inventors:

Denham,; Paul, E ^[1]

Crockett, CA

Issue Date:: 2007-09-25

Research Org.:: Lawrence Berkeley National Lab. (LBNL), Berkeley, CA (United States)

Sponsoring Org.:: USDOE

OSTI Identifier:: 916927

Patent Number(s):: 7273289

Assignee:: Euv LLC (Santa Clara, CA)

Patent Classifications (CPCs):: G - PHYSICS G02 - OPTICS G02B - OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS

G - PHYSICS G03 - PHOTOGRAPHY G03F - PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES

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G - PHYSICS G02 - OPTICS G02B - OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
G02B26/101 - {with both horizontal and vertical deflecting means, e.g. raster or XY scanners

G - PHYSICS G03 - PHOTOGRAPHY G03F - PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES
G03F7/70058 - {Mask illumination systems}
G03F7/702 - {Reflective illumination, i.e. reflective optical elements other than folding mirrors}

G - PHYSICS G21 - NUCLEAR PHYSICS G21K - TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR
G21K2201/06 - using diffractive, refractive or reflecting elements

G - PHYSICS G03 - PHOTOGRAPHY G03F - PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES
G03F7/70841 - {Constructional issues related to vacuum environment}
G03F7/70825 - {Mounting of individual elements, e.g. mounts, holders or supports

G - PHYSICS G02 - OPTICS G02B - OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
G02B7/1821 - {for rotating or oscillating mirrors}
G02B5/0891 - {Ultraviolet [UV] mirrors

G - PHYSICS G03 - PHOTOGRAPHY G03F - PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES
G03F7/701 - {Off-axis setting using an aperture}

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DOE Contract Number:: AC03-76SF00098

Resource Type:: Patent

Country of Publication:: United States

Language:: English

Subject:: 47 OTHER INSTRUMENTATION

Citation Formats


                    Denham,, and Paul, E. Vacuum compatible, high-speed, 2-D mirror tilt stage.  United States: N. p., 2007. 
        Web.

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                    Denham,, & Paul, E. Vacuum compatible, high-speed, 2-D mirror tilt stage.  United States.

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                    Denham,, and Paul, E. Tue .  
        "Vacuum compatible, high-speed, 2-D mirror tilt stage".  United States.  https://www.osti.gov/servlets/purl/916927.

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@article{osti_916927,

  title        = {Vacuum compatible, high-speed, 2-D mirror tilt stage},

  author       = {Denham, and Paul, E},

  abstractNote = {A compact and vacuum compatible magnetic-coil driven tiltable stage that is equipped with a high efficiency reflective coating can be employed as a scanner in EUV applications. The drive electronics for the scanner is fully in situ programmable and rapidly switchable.},

  doi          = {},

  journal      = {},
number       = ,

  volume       = ,

  place        = {United States},

  year         = {2007},

  month        = {9}

}

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