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Title: High-voltage compatible, full-depleted CCD

Abstract

A charge coupled device for detecting electromagnetic and particle radiation is described. The device includes a high-resistivity semiconductor substrate, buried channel regions, gate electrode circuitry, and amplifier circuitry. For good spatial resolution and high performance, especially when operated at high voltages with full or nearly full depletion of the substrate, the device can also include a guard ring positioned near channel regions, a biased channel stop, and a biased polysilicon electrode over the channel stop.

Inventors:
 [1]
  1. Hercules, CA
Issue Date:
Research Org.:
Lawrence Berkeley National Laboratory (LBNL), Berkeley, CA (United States)
Sponsoring Org.:
USDOE
OSTI Identifier:
915229
Patent Number(s):
7271468
Application Number:
11/357,769
Assignee:
The Regents of the University of California (Oakland, CA)
Patent Classifications (CPCs):
H - ELECTRICITY H01 - BASIC ELECTRIC ELEMENTS H01L - SEMICONDUCTOR DEVICES
DOE Contract Number:  
AC03-76SF00098; AC02-05CH11231
Resource Type:
Patent
Country of Publication:
United States
Language:
English
Subject:
47 OTHER INSTRUMENTATION

Citation Formats

Holland, Stephen Edward. High-voltage compatible, full-depleted CCD. United States: N. p., 2007. Web.
Holland, Stephen Edward. High-voltage compatible, full-depleted CCD. United States.
Holland, Stephen Edward. Tue . "High-voltage compatible, full-depleted CCD". United States. https://www.osti.gov/servlets/purl/915229.
@article{osti_915229,
title = {High-voltage compatible, full-depleted CCD},
author = {Holland, Stephen Edward},
abstractNote = {A charge coupled device for detecting electromagnetic and particle radiation is described. The device includes a high-resistivity semiconductor substrate, buried channel regions, gate electrode circuitry, and amplifier circuitry. For good spatial resolution and high performance, especially when operated at high voltages with full or nearly full depletion of the substrate, the device can also include a guard ring positioned near channel regions, a biased channel stop, and a biased polysilicon electrode over the channel stop.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {Tue Sep 18 00:00:00 EDT 2007},
month = {Tue Sep 18 00:00:00 EDT 2007}
}

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