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Title: Method of removing contaminants from plastic resins

Abstract

A method for removing contaminants from synthetic resin material containers using a first organic solvent system and a second carbon dioxide system. The organic solvent is utilized for removing the contaminants from the synthetic resin material and the carbon dioxide is used to separate any residual organic solvent from the synthetic resin material.

Inventors:
 [1];  [2];  [3]
  1. Harrisonville, MO
  2. Lee's Summit, MO
  3. Jamestown, CA
Issue Date:
Research Org.:
Kansas City Plant (KCP), Kansas City, MO (United States)
Sponsoring Org.:
USDOE
OSTI Identifier:
913584
Patent Number(s):
7253253
Application Number:
11/096,880
Assignee:
Honeywell Federal Manufacturing & Technology, LLC (Kansas City, MO)
Patent Classifications (CPCs):
B - PERFORMING OPERATIONS B08 - CLEANING B08B - CLEANING IN GENERAL
B - PERFORMING OPERATIONS B29 - WORKING OF PLASTICS B29B - PREPARATION OR PRETREATMENT OF THE MATERIAL TO BE SHAPED
DOE Contract Number:  
AC04-01AL66850
Resource Type:
Patent
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE

Citation Formats

Bohnert, George W, Hand, Thomas E, and Delaurentiis, Gary M. Method of removing contaminants from plastic resins. United States: N. p., 2007. Web.
Bohnert, George W, Hand, Thomas E, & Delaurentiis, Gary M. Method of removing contaminants from plastic resins. United States.
Bohnert, George W, Hand, Thomas E, and Delaurentiis, Gary M. Tue . "Method of removing contaminants from plastic resins". United States. https://www.osti.gov/servlets/purl/913584.
@article{osti_913584,
title = {Method of removing contaminants from plastic resins},
author = {Bohnert, George W and Hand, Thomas E and Delaurentiis, Gary M},
abstractNote = {A method for removing contaminants from synthetic resin material containers using a first organic solvent system and a second carbon dioxide system. The organic solvent is utilized for removing the contaminants from the synthetic resin material and the carbon dioxide is used to separate any residual organic solvent from the synthetic resin material.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {2007},
month = {8}
}