Low temperature production of large-grain polycrystalline semiconductors
Abstract
An oxide or nitride layer is provided on an amorphous semiconductor layer prior to performing metal-induced crystallization of the semiconductor layer. The oxide or nitride layer facilitates conversion of the amorphous material into large grain polycrystalline material. Hence, a native silicon dioxide layer provided on hydrogenated amorphous silicon (a-Si:H), followed by deposited Al permits induced crystallization at temperatures far below the solid phase crystallization temperature of a-Si. Solar cells and thin film transistors can be prepared using this method.
- Inventors:
-
- Fayetteville, AR
- Loudonville, NY
- Issue Date:
- Research Org.:
- DOE/EPSCOR
- Sponsoring Org.:
- USDOE
- OSTI Identifier:
- 908831
- Patent Number(s):
- 7202143
- Application Number:
- 10/972,760
- Assignee:
- The Board of Trustees of the University of Arkansas (Little Rock, AR)
- Patent Classifications (CPCs):
-
H - ELECTRICITY H01 - BASIC ELECTRIC ELEMENTS H01L - SEMICONDUCTOR DEVICES
Y - NEW / CROSS SECTIONAL TECHNOLOGIES Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE Y02E - REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- DOE Contract Number:
- 0402-03027-21-0000
- Resource Type:
- Patent
- Country of Publication:
- United States
- Language:
- English
- Subject:
- 37 INORGANIC, ORGANIC, PHYSICAL, AND ANALYTICAL CHEMISTRY
Citation Formats
Naseem, Hameed A, and Albarghouti, Marwan. Low temperature production of large-grain polycrystalline semiconductors. United States: N. p., 2007.
Web.
Naseem, Hameed A, & Albarghouti, Marwan. Low temperature production of large-grain polycrystalline semiconductors. United States.
Naseem, Hameed A, and Albarghouti, Marwan. Tue .
"Low temperature production of large-grain polycrystalline semiconductors". United States. https://www.osti.gov/servlets/purl/908831.
@article{osti_908831,
title = {Low temperature production of large-grain polycrystalline semiconductors},
author = {Naseem, Hameed A and Albarghouti, Marwan},
abstractNote = {An oxide or nitride layer is provided on an amorphous semiconductor layer prior to performing metal-induced crystallization of the semiconductor layer. The oxide or nitride layer facilitates conversion of the amorphous material into large grain polycrystalline material. Hence, a native silicon dioxide layer provided on hydrogenated amorphous silicon (a-Si:H), followed by deposited Al permits induced crystallization at temperatures far below the solid phase crystallization temperature of a-Si. Solar cells and thin film transistors can be prepared using this method.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {2007},
month = {4}
}
Works referenced in this record:
Characterization of poly-Si thin films deposited by magnetron sputtering onto Ni prelayers
journal, April 2000
- Guliants, E.; Anderson, W. A.
- Journal of Applied Physics, Vol. 87, Issue 7
Al induced crystallization of a ‐Si
journal, May 1991
- Radnoczi, G.; Robertsson, A.; Hentzell, H. T. G.
- Journal of Applied Physics, Vol. 69, Issue 9
Pd induced lateral crystallization of amorphous Si thin films
journal, March 1995
- Lee, Seok‐Woon; Jeon, Yoo‐Chan; Joo, Seung‐Ki
- Applied Physics Letters, Vol. 66, Issue 13
An investigation of laser annealed and metal-induced crystallized polycrystalline silicon thin-film transistors
journal, June 2001
- Murley, D.; Young, N.; Trainor, M.
- IEEE Transactions on Electron Devices, Vol. 48, Issue 6
Al-Induced Crystallization of an Amorphous Si Thin Film in a Polycrystalline Al/Native SiO 2 /Amorphous Si Structure
journal, April 1996
- Kim, Jin Hyeok; Lee, Jeong Yong
- Japanese Journal of Applied Physics, Vol. 35, Issue Part 1, No. 4A
Characterization of the MIC/MILC interface and its effects on the performance of MILC thin-film transistors
journal, May 2000
- Wong, Man; Jin, Zhonghe; Bhat, G. A.
- IEEE Transactions on Electron Devices, Vol. 47, Issue 5, p. 1061-1067
Metal induced crystallization of amorphous silicon
journal, July 1987
- Robertson, A. E.; Hultman, L. G.; Hentzell, H. T. G.
- Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, Vol. 5, Issue 4
Crystallization of silicon in aluminium/amorphous-silicon multilayers
journal, December 1992
- Konno, Toyohiko J.; Sinclair, Robert
- Philosophical Magazine B, Vol. 66, Issue 6
Low temperature solid phase crystallization of amorphous silicon at 380 °C
journal, December 1998
- Yoon, Soo Young; Oh, Jae Young; Kim, Chae Ok
- Journal of Applied Physics, Vol. 84, Issue 11
Kinetics of solid phase interaction between Al and a ‐Si:H
journal, November 1994
- Masaki, Yuichi; Ogata, Toshihiro; Ogawa, Hiroshi
- Journal of Applied Physics, Vol. 76, Issue 9
Silicide mediated low temperature crystallization of hydrogenated amorphous silicon in contact with aluminum
journal, July 1995
- Ashtikar, M. S.; Sharma, G. L.
- Journal of Applied Physics, Vol. 78, Issue 2
Low temperature poly-Si thin-film transistor fabrication by metal-induced lateral crystallization
journal, April 1996
- Seok-Woon Lee,
- IEEE Electron Device Letters, Vol. 17, Issue 4
Back electrode formation for poly-Si thin film solar cells on glass having AIC-grown seeding layer
journal, October 2002
- Widenborg, Per; Neuhaus, Dirk-Holger; Campbell, Patrick
- Solar Energy Materials and Solar Cells, Vol. 74, Issue 1-4
Interaction of aluminum with hydrogenated amorphous silicon at low temperatures
journal, April 1994
- Shahidul Haque, M.; Naseem, H. A.; Brown, W. D.
- Journal of Applied Physics, Vol. 75, Issue 8
Influence of interface and Al structure on layer exchange during aluminum-induced crystallization of amorphous silicon
journal, July 2000
- Nast, Oliver; Hartmann, Andreas J.
- Journal of Applied Physics, Vol. 88, Issue 2
Surface morphology of poly-Si films made by aluminium-induced crystallisation on glass substrates
journal, July 2002
- Widenborg, Per I.; Aberle, Armin G.
- Journal of Crystal Growth, Vol. 242, Issue 3-4