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Title: Method for generating extreme ultraviolet with mather-type plasma accelerators for use in Extreme Ultraviolet Lithography

Abstract

A device and method for generating extremely short-wave ultraviolet electromagnetic wave uses two intersecting plasma beams generated by two plasma accelerators. The intersection of the two plasma beams emits electromagnetic radiation and in particular radiation in the extreme ultraviolet wavelength. In the preferred orientation two axially aligned counter streaming plasmas collide to produce an intense source of electromagnetic radiation at the 13.5 nm wavelength. The Mather type plasma accelerators can utilize tin, or lithium covered electrodes. Tin, lithium or xenon can be used as the photon emitting gas source.

Inventors:
 [1];  [1]
  1. Bolingbrook, IL
Issue Date:
Research Org.:
Argonne National Lab. (ANL), Argonne, IL (United States)
Sponsoring Org.:
USDOE
OSTI Identifier:
908247
Patent Number(s):
7115887
Application Number:
11/079,238
Assignee:
The United States of America as represented by the United States Department of Energy (Washington, DC)
Patent Classifications (CPCs):
H - ELECTRICITY H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR H05G - X-RAY TECHNIQUE
DOE Contract Number:  
W-31109-ENG-38
Resource Type:
Patent
Country of Publication:
United States
Language:
English

Citation Formats

Hassanein, Ahmed, and Konkashbaev, Isak. Method for generating extreme ultraviolet with mather-type plasma accelerators for use in Extreme Ultraviolet Lithography. United States: N. p., 2006. Web.
Hassanein, Ahmed, & Konkashbaev, Isak. Method for generating extreme ultraviolet with mather-type plasma accelerators for use in Extreme Ultraviolet Lithography. United States.
Hassanein, Ahmed, and Konkashbaev, Isak. Tue . "Method for generating extreme ultraviolet with mather-type plasma accelerators for use in Extreme Ultraviolet Lithography". United States. https://www.osti.gov/servlets/purl/908247.
@article{osti_908247,
title = {Method for generating extreme ultraviolet with mather-type plasma accelerators for use in Extreme Ultraviolet Lithography},
author = {Hassanein, Ahmed and Konkashbaev, Isak},
abstractNote = {A device and method for generating extremely short-wave ultraviolet electromagnetic wave uses two intersecting plasma beams generated by two plasma accelerators. The intersection of the two plasma beams emits electromagnetic radiation and in particular radiation in the extreme ultraviolet wavelength. In the preferred orientation two axially aligned counter streaming plasmas collide to produce an intense source of electromagnetic radiation at the 13.5 nm wavelength. The Mather type plasma accelerators can utilize tin, or lithium covered electrodes. Tin, lithium or xenon can be used as the photon emitting gas source.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {2006},
month = {10}
}

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