Method for generating extreme ultraviolet with mather-type plasma accelerators for use in Extreme Ultraviolet Lithography

Hassanein, Ahmed; Konkashbaev, Isak

Title: Method for generating extreme ultraviolet with mather-type plasma accelerators for use in Extreme Ultraviolet Lithography

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Abstract

A device and method for generating extremely short-wave ultraviolet electromagnetic wave uses two intersecting plasma beams generated by two plasma accelerators. The intersection of the two plasma beams emits electromagnetic radiation and in particular radiation in the extreme ultraviolet wavelength. In the preferred orientation two axially aligned counter streaming plasmas collide to produce an intense source of electromagnetic radiation at the 13.5 nm wavelength. The Mather type plasma accelerators can utilize tin, or lithium covered electrodes. Tin, lithium or xenon can be used as the photon emitting gas source.

Inventors:

Hassanein, Ahmed ^[1]; Konkashbaev, Isak ^[1]

Bolingbrook, IL

Issue Date:: 2006-10-03

Research Org.:: Argonne National Laboratory (ANL), Argonne, IL (United States)

Sponsoring Org.:: USDOE

OSTI Identifier:: 908247

Patent Number(s):: 7115887

Application Number:: 11/079,238

Assignee:: The United States of America as represented by the United States Department of Energy (Washington, DC)

Patent Classifications (CPCs):: H - ELECTRICITY H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR H05G - X-RAY TECHNIQUE

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H - ELECTRICITY H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR H05G - X-RAY TECHNIQUE
H05G2/003 - {being produced from a liquid or gas}
H05G2/005 - {containing a metal as principal radiation generating component}

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DOE Contract Number:: W-31109-ENG-38

Resource Type:: Patent

Country of Publication:: United States

Language:: English

Citation Formats


                    Hassanein, Ahmed, and Konkashbaev, Isak. Method for generating extreme ultraviolet with mather-type plasma accelerators for use in Extreme Ultraviolet Lithography.  United States: N. p., 2006. 
        Web.

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                    Hassanein, Ahmed, & Konkashbaev, Isak. Method for generating extreme ultraviolet with mather-type plasma accelerators for use in Extreme Ultraviolet Lithography.  United States.

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                    Hassanein, Ahmed, and Konkashbaev, Isak. Tue .  
        "Method for generating extreme ultraviolet with mather-type plasma accelerators for use in Extreme Ultraviolet Lithography".  United States.  https://www.osti.gov/servlets/purl/908247.

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@article{osti_908247,

  title        = {Method for generating extreme ultraviolet with mather-type plasma accelerators for use in Extreme Ultraviolet Lithography},

  author       = {Hassanein, Ahmed and Konkashbaev, Isak},

  abstractNote = {A device and method for generating extremely short-wave ultraviolet electromagnetic wave uses two intersecting plasma beams generated by two plasma accelerators. The intersection of the two plasma beams emits electromagnetic radiation and in particular radiation in the extreme ultraviolet wavelength. In the preferred orientation two axially aligned counter streaming plasmas collide to produce an intense source of electromagnetic radiation at the 13.5 nm wavelength. The Mather type plasma accelerators can utilize tin, or lithium covered electrodes. Tin, lithium or xenon can be used as the photon emitting gas source.},

  doi          = {},

  journal      = {},
number       = ,

  volume       = ,

  place        = {United States},

  year         = {2006},

  month        = {10}

}

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