Beam Profile Monitor With Accurate Horizontal And Vertical Beam Profiles
Abstract
A widely used scanner device that rotates a single helically shaped wire probe in and out of a particle beam at different beamline positions to give a pair of mutually perpendicular beam profiles is modified by the addition of a second wire probe. As a result, a pair of mutually perpendicular beam profiles is obtained at a first beamline position, and a second pair of mutually perpendicular beam profiles is obtained at a second beamline position. The simple modification not only provides more accurate beam profiles, but also provides a measurement of the beam divergence and quality in a single compact device.
- Inventors:
-
- Knoxville, TN
- Oak Ridge, TN
- Issue Date:
- Research Org.:
- Oak Ridge National Laboratory (ORNL), Oak Ridge, TN (United States)
- Sponsoring Org.:
- USDOE
- OSTI Identifier:
- 880206
- Patent Number(s):
- 6972551
- Application Number:
- 10/673715
- Assignee:
- UT-Battelle, LLC (Oak Ridge, TN)
- Patent Classifications (CPCs):
-
G - PHYSICS G01 - MEASURING G01R - MEASURING ELECTRIC VARIABLES
H - ELECTRICITY H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR H05H - PLASMA TECHNIQUE
- DOE Contract Number:
- AC05-00OR22725
- Resource Type:
- Patent
- Country of Publication:
- United States
- Language:
- English
Citation Formats
Havener, Charles C, and Al-Rejoub, Riad. Beam Profile Monitor With Accurate Horizontal And Vertical Beam Profiles. United States: N. p., 2005.
Web.
Havener, Charles C, & Al-Rejoub, Riad. Beam Profile Monitor With Accurate Horizontal And Vertical Beam Profiles. United States.
Havener, Charles C, and Al-Rejoub, Riad. Mon .
"Beam Profile Monitor With Accurate Horizontal And Vertical Beam Profiles". United States. https://www.osti.gov/servlets/purl/880206.
@article{osti_880206,
title = {Beam Profile Monitor With Accurate Horizontal And Vertical Beam Profiles},
author = {Havener, Charles C and Al-Rejoub, Riad},
abstractNote = {A widely used scanner device that rotates a single helically shaped wire probe in and out of a particle beam at different beamline positions to give a pair of mutually perpendicular beam profiles is modified by the addition of a second wire probe. As a result, a pair of mutually perpendicular beam profiles is obtained at a first beamline position, and a second pair of mutually perpendicular beam profiles is obtained at a second beamline position. The simple modification not only provides more accurate beam profiles, but also provides a measurement of the beam divergence and quality in a single compact device.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {2005},
month = {12}
}
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