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Title: Polymeric Mold For Providing A Microscale Part

Abstract

The invention is a developer system for developing a PMMA photoresist having exposed patterns comprising features having both very small sizes, and very high aspect ratios. The developer system of the present invention comprises a developer tank, an intermediate rinse tank and a final rinse tank, each tank having a source of high frequency sonic agitation, temperature control, and continuous filtration. It has been found that by moving a patterned wafer, through a specific sequence of developer/rinse solutions, where an intermediate rinse solution completes development of those portions of the exposed resist left undeveloped after the development solution, by agitating the solutions with a source of high frequency sonic vibration, and by adjusting and closely controlling the temperatures and continuously filtering and recirculating these solutions, it is possible to maintain the kinetic dissolution of the exposed PMMA polymer as the rate limiting step.

Inventors:
 [1];  [2];  [3]
  1. Pleasanton, CA
  2. San Francisco, CA
  3. Albuquerque, NM
Issue Date:
Research Org.:
Sandia National Laboratories (SNL), Albuquerque, NM, and Livermore, CA (United States)
OSTI Identifier:
879815
Patent Number(s):
6841306
Application Number:
10/217690
Assignee:
Sandia National Laboratories (Livermore, CA)
Patent Classifications (CPCs):
B - PERFORMING OPERATIONS B29 - WORKING OF PLASTICS B29L - INDEXING SCHEME ASSOCIATED WITH SUBCLASS B29C, RELATING TO PARTICULAR ARTICLES
G - PHYSICS G03 - PHOTOGRAPHY G03F - PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES
DOE Contract Number:  
AC04-94AL85000
Resource Type:
Patent
Country of Publication:
United States
Language:
English

Citation Formats

Boehme, Dale R, Bankert, Michelle A, and Christenson, Todd R. Polymeric Mold For Providing A Microscale Part. United States: N. p., 2005. Web.
Boehme, Dale R, Bankert, Michelle A, & Christenson, Todd R. Polymeric Mold For Providing A Microscale Part. United States.
Boehme, Dale R, Bankert, Michelle A, and Christenson, Todd R. Tue . "Polymeric Mold For Providing A Microscale Part". United States. https://www.osti.gov/servlets/purl/879815.
@article{osti_879815,
title = {Polymeric Mold For Providing A Microscale Part},
author = {Boehme, Dale R and Bankert, Michelle A and Christenson, Todd R},
abstractNote = {The invention is a developer system for developing a PMMA photoresist having exposed patterns comprising features having both very small sizes, and very high aspect ratios. The developer system of the present invention comprises a developer tank, an intermediate rinse tank and a final rinse tank, each tank having a source of high frequency sonic agitation, temperature control, and continuous filtration. It has been found that by moving a patterned wafer, through a specific sequence of developer/rinse solutions, where an intermediate rinse solution completes development of those portions of the exposed resist left undeveloped after the development solution, by agitating the solutions with a source of high frequency sonic vibration, and by adjusting and closely controlling the temperatures and continuously filtering and recirculating these solutions, it is possible to maintain the kinetic dissolution of the exposed PMMA polymer as the rate limiting step.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {2005},
month = {1}
}

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