Polymeric Mold For Providing A Microscale Part
Abstract
The invention is a developer system for developing a PMMA photoresist having exposed patterns comprising features having both very small sizes, and very high aspect ratios. The developer system of the present invention comprises a developer tank, an intermediate rinse tank and a final rinse tank, each tank having a source of high frequency sonic agitation, temperature control, and continuous filtration. It has been found that by moving a patterned wafer, through a specific sequence of developer/rinse solutions, where an intermediate rinse solution completes development of those portions of the exposed resist left undeveloped after the development solution, by agitating the solutions with a source of high frequency sonic vibration, and by adjusting and closely controlling the temperatures and continuously filtering and recirculating these solutions, it is possible to maintain the kinetic dissolution of the exposed PMMA polymer as the rate limiting step.
- Inventors:
-
- Pleasanton, CA
- San Francisco, CA
- Albuquerque, NM
- Issue Date:
- Research Org.:
- Sandia National Laboratories (SNL), Albuquerque, NM, and Livermore, CA (United States)
- OSTI Identifier:
- 879815
- Patent Number(s):
- 6841306
- Application Number:
- 10/217690
- Assignee:
- Sandia National Laboratories (Livermore, CA)
- Patent Classifications (CPCs):
-
B - PERFORMING OPERATIONS B29 - WORKING OF PLASTICS B29C - SHAPING OR JOINING OF PLASTICS
B - PERFORMING OPERATIONS B29 - WORKING OF PLASTICS B29L - INDEXING SCHEME ASSOCIATED WITH SUBCLASS B29C, RELATING TO PARTICULAR ARTICLES
- DOE Contract Number:
- AC04-94AL85000
- Resource Type:
- Patent
- Country of Publication:
- United States
- Language:
- English
Citation Formats
Boehme, Dale R, Bankert, Michelle A, and Christenson, Todd R. Polymeric Mold For Providing A Microscale Part. United States: N. p., 2005.
Web.
Boehme, Dale R, Bankert, Michelle A, & Christenson, Todd R. Polymeric Mold For Providing A Microscale Part. United States.
Boehme, Dale R, Bankert, Michelle A, and Christenson, Todd R. Tue .
"Polymeric Mold For Providing A Microscale Part". United States. https://www.osti.gov/servlets/purl/879815.
@article{osti_879815,
title = {Polymeric Mold For Providing A Microscale Part},
author = {Boehme, Dale R and Bankert, Michelle A and Christenson, Todd R},
abstractNote = {The invention is a developer system for developing a PMMA photoresist having exposed patterns comprising features having both very small sizes, and very high aspect ratios. The developer system of the present invention comprises a developer tank, an intermediate rinse tank and a final rinse tank, each tank having a source of high frequency sonic agitation, temperature control, and continuous filtration. It has been found that by moving a patterned wafer, through a specific sequence of developer/rinse solutions, where an intermediate rinse solution completes development of those portions of the exposed resist left undeveloped after the development solution, by agitating the solutions with a source of high frequency sonic vibration, and by adjusting and closely controlling the temperatures and continuously filtering and recirculating these solutions, it is possible to maintain the kinetic dissolution of the exposed PMMA polymer as the rate limiting step.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {2005},
month = {1}
}