Photo-Definable Self Assembled Maerials
Abstract
The present invention provides a mesoporous material comprising at least one region of mesoporous material patterned at a lithographic scale. The present invention also provides a a method for forming a patterned mesoporous material comprising: coating a sol on a substrate to form a film, the sol comprising: a templating molecule, a photoactivator generator, a material capable of being sol-gel processed, water, and a solvent; and exposing the film to light to form a patterned mesoporous material.
- Inventors:
- Issue Date:
- Research Org.:
- Sandia National Laboratories (SNL), Albuquerque, NM, and Livermore, CA (United States)
- OSTI Identifier:
- 879758
- Patent Number(s):
- 6808867
- Application Number:
- 10/100108
- Assignee:
- Science & Technology Corporation @ University of New Mexico (Albuquerque, NM)
- Patent Classifications (CPCs):
-
G - PHYSICS G03 - PHOTOGRAPHY G03F - PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES
- DOE Contract Number:
- AC04-94AL85000
- Resource Type:
- Patent
- Country of Publication:
- United States
- Language:
- English
Citation Formats
DOSHI, DHAVAL, and et al]. Photo-Definable Self Assembled Maerials. United States: N. p., 2004.
Web.
DOSHI, DHAVAL, & et al]. Photo-Definable Self Assembled Maerials. United States.
DOSHI, DHAVAL, and et al]. Tue .
"Photo-Definable Self Assembled Maerials". United States. https://www.osti.gov/servlets/purl/879758.
@article{osti_879758,
title = {Photo-Definable Self Assembled Maerials},
author = {DOSHI, DHAVAL and et al]},
abstractNote = {The present invention provides a mesoporous material comprising at least one region of mesoporous material patterned at a lithographic scale. The present invention also provides a a method for forming a patterned mesoporous material comprising: coating a sol on a substrate to form a film, the sol comprising: a templating molecule, a photoactivator generator, a material capable of being sol-gel processed, water, and a solvent; and exposing the film to light to form a patterned mesoporous material.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {2004},
month = {10}
}
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