Apparatus and process for deposition of hard carbon films
Abstract
A process and an apparatus for depositing thin, amorphous carbon films having extreme hardness on a substrate is described. An enclosed chamber maintained at less than atmospheric pressure houses the substrate and plasma producing elements. A first electrode is comprised of a cavity enclosed within an RF coil which excites the plasma. A substrate located on a second electrode is excited by radio frequency power applied to the substrate. A magnetic field confines the plasma produced by the first electrode to the area away from the walls of the chamber and focuses the plasma onto the substrate thereby yielding film deposits having higher purity and having more rapid buildup than other methods of the prior art.
- Inventors:
-
- Menlo Park, CA
- Los Altos, CA
- Issue Date:
- Research Org.:
- Stanford Linear Accelerator Center (SLAC), Menlo Park, CA (United States); SLAC National Accelerator Laboratory (SLAC), Menlo Park, CA (United States)
- Sponsoring Org.:
- USDOE
- OSTI Identifier:
- 875224
- Patent Number(s):
- H000566
- Application Number:
- 06/804680
- Assignee:
- United States of America as represented by United States (Washington, DC)
- DOE Contract Number:
- AC03-76SF00515
- Resource Type:
- Patent
- Resource Relation:
- Patent File Date: 1985 Dec 04
- Country of Publication:
- United States
- Language:
- English
- Subject:
- statutory invention registration; apparatus; process; deposition; hard; carbon; films; depositing; amorphous; extreme; hardness; substrate; described; enclosed; chamber; maintained; atmospheric; pressure; houses; plasma; producing; elements; electrode; comprised; cavity; rf; coil; excites; located; excited; radio; frequency; power; applied; magnetic; field; confines; produced; walls; focuses; yielding; film; deposits; purity; rapid; buildup; methods; prior; rf coil; plasma produced; closed chamber; amorphous carbon; hard carbon; radio frequency; magnetic field; atmospheric pressure; carbon film; plasma producing; carbon films; frequency power; chamber maintained; power applied; enclosed chamber; producing elements; /427/118/
Citation Formats
Nyaiesh, Ali R., and Garwin, Edward L.. Apparatus and process for deposition of hard carbon films. United States: N. p., 1989.
Web.
Nyaiesh, Ali R., & Garwin, Edward L.. Apparatus and process for deposition of hard carbon films. United States.
Nyaiesh, Ali R., and Garwin, Edward L.. Sun .
"Apparatus and process for deposition of hard carbon films". United States. https://www.osti.gov/servlets/purl/875224.
@article{osti_875224,
title = {Apparatus and process for deposition of hard carbon films},
author = {Nyaiesh, Ali R. and Garwin, Edward L.},
abstractNote = {A process and an apparatus for depositing thin, amorphous carbon films having extreme hardness on a substrate is described. An enclosed chamber maintained at less than atmospheric pressure houses the substrate and plasma producing elements. A first electrode is comprised of a cavity enclosed within an RF coil which excites the plasma. A substrate located on a second electrode is excited by radio frequency power applied to the substrate. A magnetic field confines the plasma produced by the first electrode to the area away from the walls of the chamber and focuses the plasma onto the substrate thereby yielding film deposits having higher purity and having more rapid buildup than other methods of the prior art.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {1989},
month = {1}
}
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