Chemical surface deposition of ultra-thin semiconductors
Abstract
A chemical surface deposition process for forming an ultra-thin semiconducting film of Group IIB-VIA compounds onto a substrate. This process eliminates particulates formed by homogeneous reactions in bath, dramatically increases the utilization of Group IIB species, and results in the formation of a dense, adherent film for thin film solar cells. The process involves applying a pre-mixed liquid coating composition containing Group IIB and Group VIA ionic species onto a preheated substrate. Heat from the substrate causes a heterogeneous reaction between the Group IIB and VIA ionic species of the liquid coating composition, thus forming a solid reaction product film on the substrate surface.
- Inventors:
-
- 243 W. Main St., Elkton, MD 21921
- 1905 N. Van Buren St., Wilmington, DE 19802
- Issue Date:
- Research Org.:
- Univ. of Delaware, Newark, DE (United States)
- OSTI Identifier:
- 875127
- Patent Number(s):
- 6537845
- Application Number:
- 09/942,536
- Assignee:
- McCandless; Brian E. (243 W. Main St., Elkton, MD 21921); Shafarman; William N. (1905 N. Van Buren St., Wilmington, DE 19802)
- Patent Classifications (CPCs):
-
H - ELECTRICITY H01 - BASIC ELECTRIC ELEMENTS H01L - SEMICONDUCTOR DEVICES
C - CHEMISTRY C23 - COATING METALLIC MATERIAL C23C - COATING METALLIC MATERIAL
- DOE Contract Number:
- ZAK-8-17619-33
- Resource Type:
- Patent
- Country of Publication:
- United States
- Language:
- English
- Subject:
- chemical; surface; deposition; ultra-thin; semiconductors; process; forming; semiconducting; film; iib-via; compounds; substrate; eliminates; particulates; formed; homogeneous; reactions; bath; dramatically; increases; utilization; iib; species; results; formation; dense; adherent; solar; cells; involves; applying; pre-mixed; liquid; coating; composition; containing; via; ionic; preheated; heat; causes; heterogeneous; reaction; solid; product; solar cell; reaction product; substrate surface; deposition process; surface deposit; conducting film; /438/136/
Citation Formats
McCandless, Brian E, and Shafarman, William N. Chemical surface deposition of ultra-thin semiconductors. United States: N. p., 2003.
Web.
McCandless, Brian E, & Shafarman, William N. Chemical surface deposition of ultra-thin semiconductors. United States.
McCandless, Brian E, and Shafarman, William N. Wed .
"Chemical surface deposition of ultra-thin semiconductors". United States. https://www.osti.gov/servlets/purl/875127.
@article{osti_875127,
title = {Chemical surface deposition of ultra-thin semiconductors},
author = {McCandless, Brian E and Shafarman, William N},
abstractNote = {A chemical surface deposition process for forming an ultra-thin semiconducting film of Group IIB-VIA compounds onto a substrate. This process eliminates particulates formed by homogeneous reactions in bath, dramatically increases the utilization of Group IIB species, and results in the formation of a dense, adherent film for thin film solar cells. The process involves applying a pre-mixed liquid coating composition containing Group IIB and Group VIA ionic species onto a preheated substrate. Heat from the substrate causes a heterogeneous reaction between the Group IIB and VIA ionic species of the liquid coating composition, thus forming a solid reaction product film on the substrate surface.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {2003},
month = {1}
}
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