skip to main content
DOE Patents title logo U.S. Department of Energy
Office of Scientific and Technical Information

Title: Method and system for producing sputtered thin films with sub-angstrom thickness uniformity or custom thickness gradients

Abstract

A method and system for producing a thin film with highly uniform (or highly accurate custom graded) thickness on a flat or graded substrate (such as concave or convex optics), by sweeping the substrate across a vapor deposition source with controlled (and generally, time-varying) velocity. In preferred embodiments, the method includes the steps of measuring the source flux distribution (using a test piece that is held stationary while exposed to the source), calculating a set of predicted film thickness profiles, each film thickness profile assuming the measured flux distribution and a different one of a set of sweep velocity modulation recipes, and determining from the predicted film thickness profiles a sweep velocity modulation recipe which is adequate to achieve a predetermined thickness profile. Aspects of the invention include a practical method of accurately measuring source flux distribution, and a computer-implemented method employing a graphical user interface to facilitate convenient selection of an optimal or nearly optimal sweep velocity modulation recipe to achieve a desired thickness profile on a substrate. Preferably, the computer implements an algorithm in which many sweep velocity function parameters (for example, the speed at which each substrate spins about its center as it sweeps across the source)more » can be varied or set to zero.« less

Inventors:
 [1];  [2];  [3]
  1. (2262 Hampton Rd., Livermore, CA 94550)
  2. (14 Jami St., Livermore, CA 94550)
  3. (2927 Lorina St., #2, Berkeley, CA 94705-1852)
Issue Date:
Research Org.:
Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States)
OSTI Identifier:
875071
Patent Number(s):
6524449
Assignee:
Folta; James A. (2262 Hampton Rd., Livermore, CA 94550); Montcalm; Claude (14 Jami St., Livermore, CA 94550); Walton; Christopher (2927 Lorina St., #2, Berkeley, CA 94705-1852) LLNL
DOE Contract Number:  
W-7405-ENG-48
Resource Type:
Patent
Country of Publication:
United States
Language:
English
Subject:
method; producing; sputtered; films; sub-angstrom; thickness; uniformity; custom; gradients; film; highly; uniform; accurate; graded; flat; substrate; concave; convex; optics; sweeping; vapor; deposition; source; controlled; time-varying; velocity; embodiments; steps; measuring; flux; distribution; piece; held; stationary; exposed; calculating; set; predicted; profiles; profile; assuming; measured; sweep; modulation; recipes; determining; recipe; adequate; achieve; predetermined; aspects; practical; accurately; computer-implemented; employing; graphical; user; interface; facilitate; convenient; selection; optimal; nearly; computer; implements; algorithm; function; parameters; example; speed; spins; center; sweeps; varied; zero; vapor deposition; film thickness; highly uniform; /204/118/427/700/

Citation Formats

Folta, James A., Montcalm, Claude, and Walton, Christopher. Method and system for producing sputtered thin films with sub-angstrom thickness uniformity or custom thickness gradients. United States: N. p., 2003. Web.
Folta, James A., Montcalm, Claude, & Walton, Christopher. Method and system for producing sputtered thin films with sub-angstrom thickness uniformity or custom thickness gradients. United States.
Folta, James A., Montcalm, Claude, and Walton, Christopher. Wed . "Method and system for producing sputtered thin films with sub-angstrom thickness uniformity or custom thickness gradients". United States. https://www.osti.gov/servlets/purl/875071.
@article{osti_875071,
title = {Method and system for producing sputtered thin films with sub-angstrom thickness uniformity or custom thickness gradients},
author = {Folta, James A. and Montcalm, Claude and Walton, Christopher},
abstractNote = {A method and system for producing a thin film with highly uniform (or highly accurate custom graded) thickness on a flat or graded substrate (such as concave or convex optics), by sweeping the substrate across a vapor deposition source with controlled (and generally, time-varying) velocity. In preferred embodiments, the method includes the steps of measuring the source flux distribution (using a test piece that is held stationary while exposed to the source), calculating a set of predicted film thickness profiles, each film thickness profile assuming the measured flux distribution and a different one of a set of sweep velocity modulation recipes, and determining from the predicted film thickness profiles a sweep velocity modulation recipe which is adequate to achieve a predetermined thickness profile. Aspects of the invention include a practical method of accurately measuring source flux distribution, and a computer-implemented method employing a graphical user interface to facilitate convenient selection of an optimal or nearly optimal sweep velocity modulation recipe to achieve a desired thickness profile on a substrate. Preferably, the computer implements an algorithm in which many sweep velocity function parameters (for example, the speed at which each substrate spins about its center as it sweeps across the source) can be varied or set to zero.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {2003},
month = {1}
}

Patent:

Save / Share: