Surface preparation of substances for continuous convective assembly of fine particles

Title: Surface preparation of substances for continuous convective assembly of fine particles

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Abstract

A method for producing periodic nanometer-scale arrays of metal or semiconductor junctions on a clean semiconductor substrate surface is provided comprising the steps of: etching the substrate surface to make it hydrophilic, forming, under an inert atmosphere, a crystalline colloid layer on the substrate surface, depositing a metal or semiconductor material through the colloid layer onto the surface of the substrate, and removing the colloid from the substrate surface. The colloid layer is grown on the clean semiconductor surface by withdrawing the semiconductor substrate from a sol of colloid particles.

Inventors:

Rossi, Robert ^[1]

Rochester, MN

Issue Date:: 2003-01-01

Research Org.:: California Institute of Technology (Pasadena, CA)

OSTI Identifier:: 875057

Patent Number(s):: 6521541

Assignee:: California Institute of Technology (Pasadena, CA)

DOE Contract Number:: FG03-88ER13932

Resource Type:: Patent

Country of Publication:: United States

Language:: English

Subject:: surface; preparation; substances; continuous; convective; assembly; fine; particles; method; producing; periodic; nanometer-scale; arrays; metal; semiconductor; junctions; clean; substrate; provided; comprising; steps; etching; hydrophilic; forming; inert; atmosphere; crystalline; colloid; layer; depositing; material; removing; grown; withdrawing; sol; semiconductor material; substrate surface; inert atmosphere; semiconductor surface; fine particle; semiconductor junction; /438/427/

Citation Formats


                    Rossi, Robert. Surface preparation of substances for continuous convective assembly of fine particles.  United States: N. p., 2003. 
        Web.

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                    Rossi, Robert. Surface preparation of substances for continuous convective assembly of fine particles.  United States.

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                    Rossi, Robert. Wed .  
        "Surface preparation of substances for continuous convective assembly of fine particles".  United States.  https://www.osti.gov/servlets/purl/875057.

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@article{osti_875057,

  title        = {Surface preparation of substances for continuous convective assembly of fine particles},

  author       = {Rossi, Robert},

  abstractNote = {A method for producing periodic nanometer-scale arrays of metal or semiconductor junctions on a clean semiconductor substrate surface is provided comprising the steps of: etching the substrate surface to make it hydrophilic, forming, under an inert atmosphere, a crystalline colloid layer on the substrate surface, depositing a metal or semiconductor material through the colloid layer onto the surface of the substrate, and removing the colloid from the substrate surface. The colloid layer is grown on the clean semiconductor surface by withdrawing the semiconductor substrate from a sol of colloid particles.},

  doi          = {},

  journal      = {},
number       = ,

  volume       = ,

  place        = {United States},

  year         = {2003},

  month        = {1}

}

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