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Title: Method for fabricating beryllium-based multilayer structures

Abstract

Beryllium-based multilayer structures and a process for fabricating beryllium-based multilayer mirrors, useful in the wavelength region greater than the beryllium K-edge (111 .ANG. or 11.1 nm). The process includes alternating sputter deposition of beryllium and a metal, typically from the fifth row of the periodic table, such as niobium (Nb), molybdenum (Mo), ruthenium (Ru), and rhodium (Rh). The process includes not only the method of sputtering the materials, but the industrial hygiene controls for safe handling of beryllium. The mirrors made in accordance with the process may be utilized in soft x-ray and extreme-ultraviolet projection lithography, which requires mirrors of high reflectivity (>60%) for x-rays in the range of 60-140 .ANG. (60-14.0 nm).

Inventors:
 [1];  [1];  [1];  [2]
  1. (Livermore, CA)
  2. (Tracy, CA)
Issue Date:
Research Org.:
Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States)
OSTI Identifier:
875053
Patent Number(s):
6521101
Application Number:
08/762572
Assignee:
The Regents of the University of California (Oakland, CA) LLNL
DOE Contract Number:  
W-7405-ENG-48
Resource Type:
Patent
Country of Publication:
United States
Language:
English
Subject:
method; fabricating; beryllium-based; multilayer; structures; process; mirrors; useful; wavelength; region; beryllium; k-edge; 111; ang; nm; alternating; sputter; deposition; metal; typically; fifth; row; periodic; niobium; nb; molybdenum; ruthenium; ru; rhodium; sputtering; materials; industrial; hygiene; controls; safe; handling; utilized; soft; x-ray; extreme-ultraviolet; projection; lithography; requires; reflectivity; >60; x-rays; range; 60-140; multilayer structure; wavelength region; multilayer mirror; /204/

Citation Formats

Skulina, Kenneth M., Bionta, Richard M., Makowiecki, Daniel M., and Alford, Craig S. Method for fabricating beryllium-based multilayer structures. United States: N. p., 2003. Web.
Skulina, Kenneth M., Bionta, Richard M., Makowiecki, Daniel M., & Alford, Craig S. Method for fabricating beryllium-based multilayer structures. United States.
Skulina, Kenneth M., Bionta, Richard M., Makowiecki, Daniel M., and Alford, Craig S. Tue . "Method for fabricating beryllium-based multilayer structures". United States. https://www.osti.gov/servlets/purl/875053.
@article{osti_875053,
title = {Method for fabricating beryllium-based multilayer structures},
author = {Skulina, Kenneth M. and Bionta, Richard M. and Makowiecki, Daniel M. and Alford, Craig S.},
abstractNote = {Beryllium-based multilayer structures and a process for fabricating beryllium-based multilayer mirrors, useful in the wavelength region greater than the beryllium K-edge (111 .ANG. or 11.1 nm). The process includes alternating sputter deposition of beryllium and a metal, typically from the fifth row of the periodic table, such as niobium (Nb), molybdenum (Mo), ruthenium (Ru), and rhodium (Rh). The process includes not only the method of sputtering the materials, but the industrial hygiene controls for safe handling of beryllium. The mirrors made in accordance with the process may be utilized in soft x-ray and extreme-ultraviolet projection lithography, which requires mirrors of high reflectivity (>60%) for x-rays in the range of 60-140 .ANG. (60-14.0 nm).},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {2003},
month = {2}
}

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