Method for fabricating beryllium-based multilayer structures
Abstract
Beryllium-based multilayer structures and a process for fabricating beryllium-based multilayer mirrors, useful in the wavelength region greater than the beryllium K-edge (111 .ANG. or 11.1 nm). The process includes alternating sputter deposition of beryllium and a metal, typically from the fifth row of the periodic table, such as niobium (Nb), molybdenum (Mo), ruthenium (Ru), and rhodium (Rh). The process includes not only the method of sputtering the materials, but the industrial hygiene controls for safe handling of beryllium. The mirrors made in accordance with the process may be utilized in soft x-ray and extreme-ultraviolet projection lithography, which requires mirrors of high reflectivity (>60%) for x-rays in the range of 60-140 .ANG. (60-14.0 nm).
- Inventors:
-
- Livermore, CA
- Tracy, CA
- Issue Date:
- Research Org.:
- Lawrence Livermore National Laboratory (LLNL), Livermore, CA (United States)
- OSTI Identifier:
- 875053
- Patent Number(s):
- 6521101
- Application Number:
- 08/762572
- Assignee:
- The Regents of the University of California (Oakland, CA)
- Patent Classifications (CPCs):
-
B - PERFORMING OPERATIONS B82 - NANOTECHNOLOGY B82Y - SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES
C - CHEMISTRY C23 - COATING METALLIC MATERIAL C23C - COATING METALLIC MATERIAL
- DOE Contract Number:
- W-7405-ENG-48
- Resource Type:
- Patent
- Country of Publication:
- United States
- Language:
- English
- Subject:
- method; fabricating; beryllium-based; multilayer; structures; process; mirrors; useful; wavelength; region; beryllium; k-edge; 111; ang; nm; alternating; sputter; deposition; metal; typically; fifth; row; periodic; niobium; nb; molybdenum; ruthenium; ru; rhodium; sputtering; materials; industrial; hygiene; controls; safe; handling; utilized; soft; x-ray; extreme-ultraviolet; projection; lithography; requires; reflectivity; >60; x-rays; range; 60-140; multilayer structure; wavelength region; multilayer mirror; /204/
Citation Formats
Skulina, Kenneth M, Bionta, Richard M, Makowiecki, Daniel M, and Alford, Craig S. Method for fabricating beryllium-based multilayer structures. United States: N. p., 2003.
Web.
Skulina, Kenneth M, Bionta, Richard M, Makowiecki, Daniel M, & Alford, Craig S. Method for fabricating beryllium-based multilayer structures. United States.
Skulina, Kenneth M, Bionta, Richard M, Makowiecki, Daniel M, and Alford, Craig S. Wed .
"Method for fabricating beryllium-based multilayer structures". United States. https://www.osti.gov/servlets/purl/875053.
@article{osti_875053,
title = {Method for fabricating beryllium-based multilayer structures},
author = {Skulina, Kenneth M and Bionta, Richard M and Makowiecki, Daniel M and Alford, Craig S},
abstractNote = {Beryllium-based multilayer structures and a process for fabricating beryllium-based multilayer mirrors, useful in the wavelength region greater than the beryllium K-edge (111 .ANG. or 11.1 nm). The process includes alternating sputter deposition of beryllium and a metal, typically from the fifth row of the periodic table, such as niobium (Nb), molybdenum (Mo), ruthenium (Ru), and rhodium (Rh). The process includes not only the method of sputtering the materials, but the industrial hygiene controls for safe handling of beryllium. The mirrors made in accordance with the process may be utilized in soft x-ray and extreme-ultraviolet projection lithography, which requires mirrors of high reflectivity (>60%) for x-rays in the range of 60-140 .ANG. (60-14.0 nm).},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {Wed Jan 01 00:00:00 EST 2003},
month = {Wed Jan 01 00:00:00 EST 2003}
}
Works referenced in this record:
Molybdenum/beryllium multilayer mirrors for normal incidence in the extreme ultraviolet
journal, January 1995
- Skulina, K. M.; Alford, C. S.; Bionta, R. M.
- Applied Optics, Vol. 34, Issue 19