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Title: Liga developer apparatus system

Abstract

A system to fabricate precise, high aspect ratio polymeric molds by photolithograpic process is described. The molds for producing micro-scale parts from engineering materials by the LIGA process. The invention is a developer system for developing a PMMA photoresist having exposed patterns comprising features having both very small sizes, and very high aspect ratios. The developer system of the present invention comprises a developer tank, an intermediate rinse tank and a final rinse tank, each tank having a source of high frequency sonic agitation, temperature control, and continuous filtration. It has been found that by moving a patterned wafer, through a specific sequence of developer/rinse solutions, where an intermediate rinse solution completes development of those portions of the exposed resist left undeveloped after the development solution, by agitating the solutions with a source of high frequency sonic vibration, and by adjusting and closely controlling the temperatures and continuously filtering and recirculating these solutions, it is possible to maintain the kinetic dissolution of the exposed PMMA polymer as the rate limiting step.

Inventors:
 [1];  [2];  [3]
  1. (Pleasanton, CA)
  2. (San Francisco, CA)
  3. (Albuquerque, NM)
Issue Date:
Research Org.:
SANDIA CORP
OSTI Identifier:
875035
Patent Number(s):
6517665
Assignee:
Sandia National Laboratories (Livermore, CA) SNL
DOE Contract Number:  
AC04-94AL85000
Resource Type:
Patent
Country of Publication:
United States
Language:
English
Subject:
liga; developer; apparatus; fabricate; precise; aspect; ratio; polymeric; molds; photolithograpic; process; described; producing; micro-scale; engineering; materials; developing; pmma; photoresist; exposed; patterns; comprising; features; sizes; ratios; tank; intermediate; rinse; final; source; frequency; sonic; agitation; temperature; control; continuous; filtration; found; moving; patterned; wafer; specific; sequence; developerrinse; solutions; solution; completes; portions; resist; left; undeveloped; agitating; vibration; adjusting; closely; controlling; temperatures; continuously; filtering; recirculating; maintain; kinetic; dissolution; polymer; rate; limiting; step; temperature control; /156/

Citation Formats

Boehme, Dale R., Bankert, Michelle A., and Christenson, Todd R. Liga developer apparatus system. United States: N. p., 2003. Web.
Boehme, Dale R., Bankert, Michelle A., & Christenson, Todd R. Liga developer apparatus system. United States.
Boehme, Dale R., Bankert, Michelle A., and Christenson, Todd R. Wed . "Liga developer apparatus system". United States. https://www.osti.gov/servlets/purl/875035.
@article{osti_875035,
title = {Liga developer apparatus system},
author = {Boehme, Dale R. and Bankert, Michelle A. and Christenson, Todd R.},
abstractNote = {A system to fabricate precise, high aspect ratio polymeric molds by photolithograpic process is described. The molds for producing micro-scale parts from engineering materials by the LIGA process. The invention is a developer system for developing a PMMA photoresist having exposed patterns comprising features having both very small sizes, and very high aspect ratios. The developer system of the present invention comprises a developer tank, an intermediate rinse tank and a final rinse tank, each tank having a source of high frequency sonic agitation, temperature control, and continuous filtration. It has been found that by moving a patterned wafer, through a specific sequence of developer/rinse solutions, where an intermediate rinse solution completes development of those portions of the exposed resist left undeveloped after the development solution, by agitating the solutions with a source of high frequency sonic vibration, and by adjusting and closely controlling the temperatures and continuously filtering and recirculating these solutions, it is possible to maintain the kinetic dissolution of the exposed PMMA polymer as the rate limiting step.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {2003},
month = {1}
}

Patent:

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