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Title: Versatile, high-sensitivity faraday cup array for ion implanters

Abstract

An improved Faraday cup array for determining the dose of ions delivered to a substrate during ion implantation and for monitoring the uniformity of the dose delivered to the substrate. The improved Faraday cup array incorporates a variable size ion beam aperture by changing only an insertable plate that defines the aperture without changing the position of the Faraday cups which are positioned for the operation of the largest ion beam aperture. The design enables the dose sensitivity range, typically 10.sup.11 -10.sup.18 ions/cm.sup.2 to be extended to below 10.sup.6 ions/cm.sup.2. The insertable plate/aperture arrangement is structurally simple and enables scaling to aperture areas between <1 cm.sup.2 and >750 cm.sup.2, and enables ultra-high vacuum (UHV) applications by incorporation of UHV-compatible materials.

Inventors:
 [1];  [2]
  1. (Danville, CA)
  2. (Dublin, CA)
Issue Date:
Research Org.:
Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States)
OSTI Identifier:
874991
Patent Number(s):
6507033
Assignee:
The Regents of the University of California (Oakland, CA) LLNL
DOE Contract Number:  
W-7405-ENG-48
Resource Type:
Patent
Country of Publication:
United States
Language:
English
Subject:
versatile; high-sensitivity; faraday; cup; array; implanters; improved; determining; dose; delivered; substrate; implantation; monitoring; uniformity; incorporates; variable; size; beam; aperture; changing; insertable; plate; defines; position; cups; positioned; operation; largest; design; enables; sensitivity; range; typically; 10sup11; -10sup18; ionscmsup2; extended; below; 10sup6; plateaperture; arrangement; structurally; simple; scaling; <1; cmsup2; >750; ultra-high; vacuum; uhv; applications; incorporation; uhv-compatible; materials; ultra-high vacuum; /250/

Citation Formats

Musket, Ronald G., and Patterson, Robert G. Versatile, high-sensitivity faraday cup array for ion implanters. United States: N. p., 2003. Web.
Musket, Ronald G., & Patterson, Robert G. Versatile, high-sensitivity faraday cup array for ion implanters. United States.
Musket, Ronald G., and Patterson, Robert G. Wed . "Versatile, high-sensitivity faraday cup array for ion implanters". United States. https://www.osti.gov/servlets/purl/874991.
@article{osti_874991,
title = {Versatile, high-sensitivity faraday cup array for ion implanters},
author = {Musket, Ronald G. and Patterson, Robert G.},
abstractNote = {An improved Faraday cup array for determining the dose of ions delivered to a substrate during ion implantation and for monitoring the uniformity of the dose delivered to the substrate. The improved Faraday cup array incorporates a variable size ion beam aperture by changing only an insertable plate that defines the aperture without changing the position of the Faraday cups which are positioned for the operation of the largest ion beam aperture. The design enables the dose sensitivity range, typically 10.sup.11 -10.sup.18 ions/cm.sup.2 to be extended to below 10.sup.6 ions/cm.sup.2. The insertable plate/aperture arrangement is structurally simple and enables scaling to aperture areas between <1 cm.sup.2 and >750 cm.sup.2, and enables ultra-high vacuum (UHV) applications by incorporation of UHV-compatible materials.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {2003},
month = {1}
}

Patent:

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