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Title: Lithographic fabrication of nanoapertures

Abstract

A new class of silicon-based lithographically defined nanoapertures and processes for their fabrication using conventional silicon microprocessing technology have been invented. The new ability to create and control such structures should significantly extend our ability to design and implement chemically selective devices and processes.

Inventors:
 [1]
  1. Albuquerque, NM
Issue Date:
Research Org.:
Sandia National Laboratories (SNL), Albuquerque, NM, and Livermore, CA (United States)
OSTI Identifier:
874974
Patent Number(s):
6503409
Assignee:
Sandia Corporation (Albuquerque, NM)
Patent Classifications (CPCs):
B - PERFORMING OPERATIONS B81 - MICROSTRUCTURAL TECHNOLOGY B81C - PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
G - PHYSICS G01 - MEASURING G01N - INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
DOE Contract Number:  
AC04-94AL85000
Resource Type:
Patent
Country of Publication:
United States
Language:
English
Subject:
lithographic; fabrication; nanoapertures; silicon-based; lithographically; defined; processes; conventional; silicon; microprocessing; technology; invented; ability; create; control; structures; significantly; extend; design; implement; chemically; selective; devices; /216/

Citation Formats

Fleming, James G. Lithographic fabrication of nanoapertures. United States: N. p., 2003. Web.
Fleming, James G. Lithographic fabrication of nanoapertures. United States.
Fleming, James G. Wed . "Lithographic fabrication of nanoapertures". United States. https://www.osti.gov/servlets/purl/874974.
@article{osti_874974,
title = {Lithographic fabrication of nanoapertures},
author = {Fleming, James G},
abstractNote = {A new class of silicon-based lithographically defined nanoapertures and processes for their fabrication using conventional silicon microprocessing technology have been invented. The new ability to create and control such structures should significantly extend our ability to design and implement chemically selective devices and processes.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {2003},
month = {1}
}

Patent:

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