Lithographic fabrication of nanoapertures

Fleming, James G

Title: Lithographic fabrication of nanoapertures

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Abstract

A new class of silicon-based lithographically defined nanoapertures and processes for their fabrication using conventional silicon microprocessing technology have been invented. The new ability to create and control such structures should significantly extend our ability to design and implement chemically selective devices and processes.

Inventors:

Fleming, James G ^[1]

Albuquerque, NM

Issue Date:: 2003-01-01

Research Org.:: Sandia National Laboratories (SNL), Albuquerque, NM, and Livermore, CA (United States)

OSTI Identifier:: 874974

Patent Number(s):: 6503409

Assignee:: Sandia Corporation (Albuquerque, NM)

Patent Classifications (CPCs):: B - PERFORMING OPERATIONS B81 - MICROSTRUCTURAL TECHNOLOGY B81C - PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS

G - PHYSICS G01 - MEASURING G01N - INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES

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B - PERFORMING OPERATIONS B81 - MICROSTRUCTURAL TECHNOLOGY B81C - PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
B81C1/00619 - {Forming high aspect ratio structures having deep steep walls}

G - PHYSICS G01 - MEASURING G01N - INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
G01N33/48721 - {Investigating individual macromolecules, e.g. by translocation through nanopores

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DOE Contract Number:: AC04-94AL85000

Resource Type:: Patent

Country of Publication:: United States

Language:: English

Subject:: lithographic; fabrication; nanoapertures; silicon-based; lithographically; defined; processes; conventional; silicon; microprocessing; technology; invented; ability; create; control; structures; significantly; extend; design; implement; chemically; selective; devices; /216/

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                    Fleming, James G. Lithographic fabrication of nanoapertures.  United States: N. p., 2003. 
        Web.

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                    Fleming, James G. Lithographic fabrication of nanoapertures.  United States.

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                    Fleming, James G. Wed .  
        "Lithographic fabrication of nanoapertures".  United States.  https://www.osti.gov/servlets/purl/874974.

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@article{osti_874974,

  title        = {Lithographic fabrication of nanoapertures},

  author       = {Fleming, James G},

  abstractNote = {A new class of silicon-based lithographically defined nanoapertures and processes for their fabrication using conventional silicon microprocessing technology have been invented. The new ability to create and control such structures should significantly extend our ability to design and implement chemically selective devices and processes.},

  doi          = {},

  journal      = {},
number       = ,

  volume       = ,

  place        = {United States},

  year         = {2003},

  month        = {1}

}

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