skip to main content
DOE Patents title logo U.S. Department of Energy
Office of Scientific and Technical Information

Title: Lithographic fabrication of nanoapertures

Abstract

A new class of silicon-based lithographically defined nanoapertures and processes for their fabrication using conventional silicon microprocessing technology have been invented. The new ability to create and control such structures should significantly extend our ability to design and implement chemically selective devices and processes.

Inventors:
 [1]
  1. (Albuquerque, NM)
Issue Date:
Research Org.:
SANDIA CORP
OSTI Identifier:
874974
Patent Number(s):
6503409
Assignee:
Sandia Corporation (Albuquerque, NM) SNL
DOE Contract Number:  
AC04-94AL85000
Resource Type:
Patent
Country of Publication:
United States
Language:
English
Subject:
lithographic; fabrication; nanoapertures; silicon-based; lithographically; defined; processes; conventional; silicon; microprocessing; technology; invented; ability; create; control; structures; significantly; extend; design; implement; chemically; selective; devices; /216/

Citation Formats

Fleming, James G. Lithographic fabrication of nanoapertures. United States: N. p., 2003. Web.
Fleming, James G. Lithographic fabrication of nanoapertures. United States.
Fleming, James G. Wed . "Lithographic fabrication of nanoapertures". United States. https://www.osti.gov/servlets/purl/874974.
@article{osti_874974,
title = {Lithographic fabrication of nanoapertures},
author = {Fleming, James G.},
abstractNote = {A new class of silicon-based lithographically defined nanoapertures and processes for their fabrication using conventional silicon microprocessing technology have been invented. The new ability to create and control such structures should significantly extend our ability to design and implement chemically selective devices and processes.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {2003},
month = {1}
}

Patent:

Save / Share: