Electrostatically focused addressable field emission array chips (AFEA's) for high-speed massively parallel maskless digital E-beam direct write lithography and scanning electron microscopy

Title: Electrostatically focused addressable field emission array chips (AFEA's) for high-speed massively parallel maskless digital E-beam direct write lithography and scanning electron microscopy

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Abstract

Systems and methods are described for addressable field emission array (AFEA) chips. A method of operating an addressable field-emission array, includes: generating a plurality of electron beams from a pluralitly of emitters that compose the addressable field-emission array; and focusing at least one of the plurality of electron beams with an on-chip electrostatic focusing stack. The systems and methods provide advantages including the avoidance of space-charge blow-up.

Inventors:

Thomas, Clarence E ^[1]; Baylor, Larry R ^[2]; Voelkl, Edgar ^[3]; Simpson, Michael L ^[1]; Paulus, Michael J ^[1]; Lowndes, Douglas H ^[1]; Whealton, John H ^[3]; Whitson, John C ^[4]; Wilgen, John B ^[3]

Knoxville, TN
Farragut, TN
Oak Ridge, TN
Clinton, TN

Issue Date:: 2002-12-24

Research Org.:: Lockheed Martin Energy Research Corporation

OSTI Identifier:: 874963

Patent Number(s):: 6498349

Application Number:: 09/368,919

Assignee:: UT-Battelle (Oakridge, TN)

Resource Type:: Patent

Country of Publication:: United States

Language:: English

Subject:: electrostatically; focused; addressable; field; emission; array; chips; afeas; high-speed; massively; parallel; maskless; digital; e-beam; direct; write; lithography; scanning; electron; microscopy; systems; methods; described; afea; method; operating; field-emission; generating; plurality; beams; pluralitly; emitters; compose; focusing; on-chip; electrostatic; stack; provide; advantages; including; avoidance; space-charge; blow-up; electron beam; field emission; methods provide; scanning electron; massively parallel; electron microscopy; /250/

Citation Formats


                    Thomas, Clarence E, Baylor, Larry R, Voelkl, Edgar, Simpson, Michael L, Paulus, Michael J, Lowndes, Douglas H, Whealton, John H, Whitson, John C, and Wilgen, John B. Electrostatically focused addressable field emission array chips (AFEA's) for high-speed massively parallel maskless digital E-beam direct write lithography and scanning electron microscopy.  United States: N. p., 2002. 
        Web.

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                    Thomas, Clarence E, Baylor, Larry R, Voelkl, Edgar, Simpson, Michael L, Paulus, Michael J, Lowndes, Douglas H, Whealton, John H, Whitson, John C, & Wilgen, John B. Electrostatically focused addressable field emission array chips (AFEA's) for high-speed massively parallel maskless digital E-beam direct write lithography and scanning electron microscopy.  United States.

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                    Thomas, Clarence E, Baylor, Larry R, Voelkl, Edgar, Simpson, Michael L, Paulus, Michael J, Lowndes, Douglas H, Whealton, John H, Whitson, John C, and Wilgen, John B. Tue .  
        "Electrostatically focused addressable field emission array chips (AFEA's) for high-speed massively parallel maskless digital E-beam direct write lithography and scanning electron microscopy".  United States.  https://www.osti.gov/servlets/purl/874963.

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@article{osti_874963,

  title        = {Electrostatically focused addressable field emission array chips (AFEA's) for high-speed massively parallel maskless digital E-beam direct write lithography and scanning electron microscopy},

  author       = {Thomas, Clarence E and Baylor, Larry R and Voelkl, Edgar and Simpson, Michael L and Paulus, Michael J and Lowndes, Douglas H and Whealton, John H and Whitson, John C and Wilgen, John B},

  abstractNote = {Systems and methods are described for addressable field emission array (AFEA) chips. A method of operating an addressable field-emission array, includes: generating a plurality of electron beams from a pluralitly of emitters that compose the addressable field-emission array; and focusing at least one of the plurality of electron beams with an on-chip electrostatic focusing stack. The systems and methods provide advantages including the avoidance of space-charge blow-up.},

  doi          = {},

  journal      = {},
number       = ,

  volume       = ,

  place        = {United States},

  year         = {2002},

  month        = {12}

}

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