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Title: Mitigation of substrate defects in reflective reticles using sequential coating and annealing

Abstract

A buffer-layer to minimize the size of defects on a reticle substrate prior to deposition of a reflective coating on the substrate. The buffer-layer is formed by either a multilayer deposited on the substrate or by a plurality of sequentially deposited and annealed coatings deposited on the substrate. The plurality of sequentially deposited and annealed coating may comprise multilayer and single layer coatings. The multilayer deposited and annealed buffer layer coatings may be of the same or different material than the reflecting coating thereafter deposited on the buffer-layer.

Inventors:
 [1]
  1. (Sunol, CA)
Issue Date:
Research Org.:
Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States)
OSTI Identifier:
874914
Patent Number(s):
6489066
Assignee:
The Regents of the University of California (Oakland, CA) LLNL
DOE Contract Number:  
W-7405-ENG-48
Resource Type:
Patent
Country of Publication:
United States
Language:
English
Subject:
mitigation; substrate; defects; reflective; reticles; sequential; coating; annealing; buffer-layer; minimize; size; reticle; prior; deposition; formed; multilayer; deposited; plurality; sequentially; annealed; coatings; single; layer; buffer; material; reflecting; thereafter; buffer layer; single layer; reflective coating; substrate prior; /430/378/

Citation Formats

Mirkanimi, Paul B. Mitigation of substrate defects in reflective reticles using sequential coating and annealing. United States: N. p., 2002. Web.
Mirkanimi, Paul B. Mitigation of substrate defects in reflective reticles using sequential coating and annealing. United States.
Mirkanimi, Paul B. Tue . "Mitigation of substrate defects in reflective reticles using sequential coating and annealing". United States. https://www.osti.gov/servlets/purl/874914.
@article{osti_874914,
title = {Mitigation of substrate defects in reflective reticles using sequential coating and annealing},
author = {Mirkanimi, Paul B.},
abstractNote = {A buffer-layer to minimize the size of defects on a reticle substrate prior to deposition of a reflective coating on the substrate. The buffer-layer is formed by either a multilayer deposited on the substrate or by a plurality of sequentially deposited and annealed coatings deposited on the substrate. The plurality of sequentially deposited and annealed coating may comprise multilayer and single layer coatings. The multilayer deposited and annealed buffer layer coatings may be of the same or different material than the reflecting coating thereafter deposited on the buffer-layer.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {2002},
month = {1}
}

Patent:

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