DOE Patents title logo U.S. Department of Energy
Office of Scientific and Technical Information

Title: Light scattering apparatus and method for determining radiation exposure to plastic detectors

Abstract

An improved system and method of analyzing cumulative radiation exposure registered as pits on track etch foils of radiation dosimeters. The light scattering apparatus and method of the present invention increases the speed of analysis while it also provides the ability to analyze exposure levels beyond that which may be properly measured with conventional techniques. Dosimeters often contain small plastic sheets that register accumulated damage when exposed to a radiation source. When the plastic sheet from the dosimeter is chemically etched, a track etch foil is produced wherein pits or holes are created in the plastic. The number of these pits, or holes, per unit of area (pit density) correspond to the amount of cumulative radiation exposure which is being optically measured by the apparatus. To measure the cumulative radiation exposure of a track etch foil a high intensity collimated beam is passed through foil such that the pits and holes within the track etch foil cause a portion of the impinging light beam to become scattered upon exit. The scattered light is focused with a lens, while the primary collimated light beam (unscattered light) is blocked. The scattered light is focused by the lens onto an optical detector capablemore » of registering the optical power of the scattered light which corresponds to the cumulative radiation to which the track etch foil has been exposed.

Inventors:
 [1]
  1. White Rock, NM
Issue Date:
Research Org.:
Los Alamos National Laboratory (LANL), Los Alamos, NM (United States)
OSTI Identifier:
874862
Patent Number(s):
6476910
Assignee:
The Regents of the University of California (Oakland, CA)
Patent Classifications (CPCs):
G - PHYSICS G01 - MEASURING G01N - INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
DOE Contract Number:  
W-7405-ENG-36
Resource Type:
Patent
Country of Publication:
United States
Language:
English
Subject:
light; scattering; apparatus; method; determining; radiation; exposure; plastic; detectors; improved; analyzing; cumulative; registered; pits; track; etch; foils; dosimeters; increases; speed; analysis; provides; ability; analyze; levels; properly; measured; conventional; techniques; contain; sheets; register; accumulated; damage; exposed; source; sheet; dosimeter; chemically; etched; foil; produced; holes; created; unit; pit; density; amount; optically; measure; intensity; collimated; beam; passed; portion; impinging; scattered; exit; focused; lens; primary; unscattered; blocked; optical; detector; capable; registering; power; corresponds; light beam; radiation source; collimated beam; radiation dosimeter; track etch; /356/250/

Citation Formats

Hermes, Robert E. Light scattering apparatus and method for determining radiation exposure to plastic detectors. United States: N. p., 2002. Web.
Hermes, Robert E. Light scattering apparatus and method for determining radiation exposure to plastic detectors. United States.
Hermes, Robert E. Tue . "Light scattering apparatus and method for determining radiation exposure to plastic detectors". United States. https://www.osti.gov/servlets/purl/874862.
@article{osti_874862,
title = {Light scattering apparatus and method for determining radiation exposure to plastic detectors},
author = {Hermes, Robert E},
abstractNote = {An improved system and method of analyzing cumulative radiation exposure registered as pits on track etch foils of radiation dosimeters. The light scattering apparatus and method of the present invention increases the speed of analysis while it also provides the ability to analyze exposure levels beyond that which may be properly measured with conventional techniques. Dosimeters often contain small plastic sheets that register accumulated damage when exposed to a radiation source. When the plastic sheet from the dosimeter is chemically etched, a track etch foil is produced wherein pits or holes are created in the plastic. The number of these pits, or holes, per unit of area (pit density) correspond to the amount of cumulative radiation exposure which is being optically measured by the apparatus. To measure the cumulative radiation exposure of a track etch foil a high intensity collimated beam is passed through foil such that the pits and holes within the track etch foil cause a portion of the impinging light beam to become scattered upon exit. The scattered light is focused with a lens, while the primary collimated light beam (unscattered light) is blocked. The scattered light is focused by the lens onto an optical detector capable of registering the optical power of the scattered light which corresponds to the cumulative radiation to which the track etch foil has been exposed.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {Tue Jan 01 00:00:00 EST 2002},
month = {Tue Jan 01 00:00:00 EST 2002}
}

Works referenced in this record:

Technological Applications of Ion Tracks in Insulators
journal, December 1995


Ion Tracks in Solids: From Science to Technology to Diverse Applications
journal, December 1995


Fully automated image analysis of etched tracks in CR-39
journal, September 1992


A New Method for Reading CR-39 by Using Coherent Light Scattering
journal, September 1999