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Title: Diffraction spectral filter for use in extreme-UV lithography condenser

Abstract

A condenser system for generating a beam of radiation includes a source of radiation light that generates a continuous spectrum of radiation light; a condenser comprising one or more first optical elements for collecting radiation from the source of radiation light and for generating a beam of radiation; and a diffractive spectral filter for separating first radiation light having a particular wavelength from the continuous spectrum of radiation light. Cooling devices can be employed to remove heat generated. The condenser system can be used with a ringfield camera in projection lithography.

Inventors:
 [1];  [2];  [3]
  1. (Albuquerque, NM)
  2. (Castro Valley, CA)
  3. (Livermore, CA)
Issue Date:
Research Org.:
SANDIA CORP
OSTI Identifier:
874831
Patent Number(s):
6469827
Assignee:
EUV LLC (Santa Clara, CA) SNL
DOE Contract Number:  
AC04-94AL85000
Resource Type:
Patent
Country of Publication:
United States
Language:
English
Subject:
diffraction; spectral; filter; extreme-uv; lithography; condenser; generating; beam; radiation; source; light; generates; continuous; spectrum; comprising; optical; elements; collecting; diffractive; separating; wavelength; cooling; devices; employed; remove; heat; generated; ringfield; camera; projection; remove heat; extreme-uv lithography; /359/355/378/

Citation Formats

Sweatt, William C., Tichenor, Daniel A., and Bernardez, Luis J. Diffraction spectral filter for use in extreme-UV lithography condenser. United States: N. p., 2002. Web.
Sweatt, William C., Tichenor, Daniel A., & Bernardez, Luis J. Diffraction spectral filter for use in extreme-UV lithography condenser. United States.
Sweatt, William C., Tichenor, Daniel A., and Bernardez, Luis J. Tue . "Diffraction spectral filter for use in extreme-UV lithography condenser". United States. https://www.osti.gov/servlets/purl/874831.
@article{osti_874831,
title = {Diffraction spectral filter for use in extreme-UV lithography condenser},
author = {Sweatt, William C. and Tichenor, Daniel A. and Bernardez, Luis J.},
abstractNote = {A condenser system for generating a beam of radiation includes a source of radiation light that generates a continuous spectrum of radiation light; a condenser comprising one or more first optical elements for collecting radiation from the source of radiation light and for generating a beam of radiation; and a diffractive spectral filter for separating first radiation light having a particular wavelength from the continuous spectrum of radiation light. Cooling devices can be employed to remove heat generated. The condenser system can be used with a ringfield camera in projection lithography.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {2002},
month = {1}
}

Patent:

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