Programmable nanometer-scale electrolytic metal deposition and depletion
Abstract
A method of nanometer-scale deposition of a metal onto a nanostructure includes the steps of: providing a substrate having thereon at least two electrically conductive nanostructures spaced no more than about 50 .mu.m apart; and depositing metal on at least one of the nanostructures by electric field-directed, programmable, pulsed electrolytic metal deposition. Moreover, a method of nanometer-scale depletion of a metal from a nanostructure includes the steps of providing a substrate having thereon at least two electrically conductive nanostructures spaced no more than about 50 .mu.m apart, at least one of the nanostructures having a metal disposed thereon; and depleting at least a portion of the metal from the nanostructure by electric field-directed, programmable, pulsed electrolytic metal depletion. A bypass circuit enables ultra-finely controlled deposition.
- Inventors:
-
- Oak Ridge, TN
- Issue Date:
- Research Org.:
- Oak Ridge National Lab. (ORNL), Oak Ridge, TN (United States)
- Sponsoring Org.:
- USDOE
- OSTI Identifier:
- 874713
- Patent Number(s):
- 6447663
- Assignee:
- UT-Battelle, LLC (Oak Ridge, TN)
- Patent Classifications (CPCs):
-
Y - NEW / CROSS SECTIONAL TECHNOLOGIES Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC Y10S - TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
B - PERFORMING OPERATIONS B82 - NANOTECHNOLOGY B82Y - SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES
- DOE Contract Number:
- AC05-00OR22725
- Resource Type:
- Patent
- Country of Publication:
- United States
- Language:
- English
- Subject:
- programmable; nanometer-scale; electrolytic; metal; deposition; depletion; method; nanostructure; steps; providing; substrate; electrically; conductive; nanostructures; spaced; 50; mum; apart; depositing; electric; field-directed; pulsed; moreover; disposed; depleting; portion; bypass; circuit; enables; ultra-finely; controlled; electrically conductive; electric field; metal deposition; /205/
Citation Formats
Lee, James Weifu, and Greenbaum, Elias. Programmable nanometer-scale electrolytic metal deposition and depletion. United States: N. p., 2002.
Web.
Lee, James Weifu, & Greenbaum, Elias. Programmable nanometer-scale electrolytic metal deposition and depletion. United States.
Lee, James Weifu, and Greenbaum, Elias. Tue .
"Programmable nanometer-scale electrolytic metal deposition and depletion". United States. https://www.osti.gov/servlets/purl/874713.
@article{osti_874713,
title = {Programmable nanometer-scale electrolytic metal deposition and depletion},
author = {Lee, James Weifu and Greenbaum, Elias},
abstractNote = {A method of nanometer-scale deposition of a metal onto a nanostructure includes the steps of: providing a substrate having thereon at least two electrically conductive nanostructures spaced no more than about 50 .mu.m apart; and depositing metal on at least one of the nanostructures by electric field-directed, programmable, pulsed electrolytic metal deposition. Moreover, a method of nanometer-scale depletion of a metal from a nanostructure includes the steps of providing a substrate having thereon at least two electrically conductive nanostructures spaced no more than about 50 .mu.m apart, at least one of the nanostructures having a metal disposed thereon; and depleting at least a portion of the metal from the nanostructure by electric field-directed, programmable, pulsed electrolytic metal depletion. A bypass circuit enables ultra-finely controlled deposition.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {2002},
month = {9}
}
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