Compact multi-bounce projection system for extreme ultraviolet projection lithography
Abstract
An optical system compatible with short wavelength (extreme ultraviolet) radiation comprising four optical elements providing five reflective surfaces for projecting a mask image onto a substrate. The five optical surfaces are characterized in order from object to image as concave, convex, concave, convex and concave mirrors. The second and fourth reflective surfaces are part of the same optical element. The optical system is particularly suited for ring field step and scan lithography methods. The invention uses aspheric mirrors to minimize static distortion and balance the static distortion across the ring field width, which effectively minimizes dynamic distortion.
- Inventors:
-
- San Ramon, CA
- Issue Date:
- Research Org.:
- Lawrence Livermore National Laboratory (LLNL), Livermore, CA (United States)
- OSTI Identifier:
- 874628
- Patent Number(s):
- 6426506
- Assignee:
- The Regents of the University of California (Oakland, CA)
- Patent Classifications (CPCs):
-
G - PHYSICS G03 - PHOTOGRAPHY G03F - PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES
G - PHYSICS G21 - NUCLEAR PHYSICS G21K - TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR
- DOE Contract Number:
- W-7405-ENG-48
- Resource Type:
- Patent
- Country of Publication:
- United States
- Language:
- English
- Subject:
- compact; multi-bounce; projection; extreme; ultraviolet; lithography; optical; compatible; wavelength; radiation; comprising; elements; providing; five; reflective; surfaces; projecting; mask; image; substrate; characterized; concave; convex; mirrors; fourth; element; suited; field; step; scan; methods; aspheric; minimize; static; distortion; balance; width; effectively; minimizes; dynamic; extreme ultraviolet; projection lithography; /250/359/378/
Citation Formats
Hudyma, Russell M. Compact multi-bounce projection system for extreme ultraviolet projection lithography. United States: N. p., 2002.
Web.
Hudyma, Russell M. Compact multi-bounce projection system for extreme ultraviolet projection lithography. United States.
Hudyma, Russell M. Tue .
"Compact multi-bounce projection system for extreme ultraviolet projection lithography". United States. https://www.osti.gov/servlets/purl/874628.
@article{osti_874628,
title = {Compact multi-bounce projection system for extreme ultraviolet projection lithography},
author = {Hudyma, Russell M},
abstractNote = {An optical system compatible with short wavelength (extreme ultraviolet) radiation comprising four optical elements providing five reflective surfaces for projecting a mask image onto a substrate. The five optical surfaces are characterized in order from object to image as concave, convex, concave, convex and concave mirrors. The second and fourth reflective surfaces are part of the same optical element. The optical system is particularly suited for ring field step and scan lithography methods. The invention uses aspheric mirrors to minimize static distortion and balance the static distortion across the ring field width, which effectively minimizes dynamic distortion.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {2002},
month = {1}
}
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