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Title: Compact multi-bounce projection system for extreme ultraviolet projection lithography

Abstract

An optical system compatible with short wavelength (extreme ultraviolet) radiation comprising four optical elements providing five reflective surfaces for projecting a mask image onto a substrate. The five optical surfaces are characterized in order from object to image as concave, convex, concave, convex and concave mirrors. The second and fourth reflective surfaces are part of the same optical element. The optical system is particularly suited for ring field step and scan lithography methods. The invention uses aspheric mirrors to minimize static distortion and balance the static distortion across the ring field width, which effectively minimizes dynamic distortion.

Inventors:
 [1]
  1. (San Ramon, CA)
Issue Date:
Research Org.:
Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States)
OSTI Identifier:
874628
Patent Number(s):
6426506
Assignee:
The Regents of the University of California (Oakland, CA) LLNL
DOE Contract Number:  
W-7405-ENG-48
Resource Type:
Patent
Country of Publication:
United States
Language:
English
Subject:
compact; multi-bounce; projection; extreme; ultraviolet; lithography; optical; compatible; wavelength; radiation; comprising; elements; providing; five; reflective; surfaces; projecting; mask; image; substrate; characterized; concave; convex; mirrors; fourth; element; suited; field; step; scan; methods; aspheric; minimize; static; distortion; balance; width; effectively; minimizes; dynamic; extreme ultraviolet; projection lithography; /250/359/378/

Citation Formats

Hudyma, Russell M. Compact multi-bounce projection system for extreme ultraviolet projection lithography. United States: N. p., 2002. Web.
Hudyma, Russell M. Compact multi-bounce projection system for extreme ultraviolet projection lithography. United States.
Hudyma, Russell M. Tue . "Compact multi-bounce projection system for extreme ultraviolet projection lithography". United States. https://www.osti.gov/servlets/purl/874628.
@article{osti_874628,
title = {Compact multi-bounce projection system for extreme ultraviolet projection lithography},
author = {Hudyma, Russell M.},
abstractNote = {An optical system compatible with short wavelength (extreme ultraviolet) radiation comprising four optical elements providing five reflective surfaces for projecting a mask image onto a substrate. The five optical surfaces are characterized in order from object to image as concave, convex, concave, convex and concave mirrors. The second and fourth reflective surfaces are part of the same optical element. The optical system is particularly suited for ring field step and scan lithography methods. The invention uses aspheric mirrors to minimize static distortion and balance the static distortion across the ring field width, which effectively minimizes dynamic distortion.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {2002},
month = {1}
}

Patent:

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