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Title: Optical monitor for real time thickness change measurements via lateral-translation induced phase-stepping interferometry

Abstract

An optical monitoring instrument monitors etch depth and etch rate for controlling a wet-etching process. The instrument provides means for viewing through the back side of a thick optic onto a nearly index-matched interface. Optical baffling and the application of a photoresist mask minimize spurious reflections to allow for monitoring with extremely weak signals. A Wollaston prism enables linear translation for phase stepping.

Inventors:
 [1]
  1. (Livermore, CA)
Issue Date:
Research Org.:
Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States)
OSTI Identifier:
874545
Patent Number(s):
6411389
Assignee:
The Regents of the University of Claifornia (Oakland, CA) LLNL
DOE Contract Number:  
W-7405-ENG-48
Resource Type:
Patent
Country of Publication:
United States
Language:
English
Subject:
optical; monitor; time; thickness; change; measurements; via; lateral-translation; induced; phase-stepping; interferometry; monitoring; instrument; monitors; etch; depth; rate; controlling; wet-etching; process; provides; means; viewing; thick; optic; nearly; index-matched; interface; baffling; application; photoresist; mask; minimize; spurious; reflections; allow; extremely; weak; signals; wollaston; prism; enables; linear; translation; phase; stepping; etching process; optical monitor; /356/

Citation Formats

Rushford, Michael C. Optical monitor for real time thickness change measurements via lateral-translation induced phase-stepping interferometry. United States: N. p., 2002. Web.
Rushford, Michael C. Optical monitor for real time thickness change measurements via lateral-translation induced phase-stepping interferometry. United States.
Rushford, Michael C. Tue . "Optical monitor for real time thickness change measurements via lateral-translation induced phase-stepping interferometry". United States. https://www.osti.gov/servlets/purl/874545.
@article{osti_874545,
title = {Optical monitor for real time thickness change measurements via lateral-translation induced phase-stepping interferometry},
author = {Rushford, Michael C.},
abstractNote = {An optical monitoring instrument monitors etch depth and etch rate for controlling a wet-etching process. The instrument provides means for viewing through the back side of a thick optic onto a nearly index-matched interface. Optical baffling and the application of a photoresist mask minimize spurious reflections to allow for monitoring with extremely weak signals. A Wollaston prism enables linear translation for phase stepping.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {2002},
month = {1}
}

Patent:

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