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Title: Porous body infiltrating method

Abstract

A mixture is formed that comprises at least some to about 10 wt % boron nitride and silicon. A body comprising a component that is wetted by or reacts with silicon is contacted with the mixture and the contacted body is infiltrated with silicon from the mixture.

Inventors:
 [1]
  1. (Ballston Lake, NY)
Issue Date:
Research Org.:
General Electric Co
OSTI Identifier:
874507
Patent Number(s):
6403158
Assignee:
General Electric Company (Schenectady, NY) CHO
DOE Contract Number:  
FC02-92CE41000
Resource Type:
Patent
Country of Publication:
United States
Language:
English
Subject:
porous; infiltrating; method; mixture; formed; 10; wt; boron; nitride; silicon; comprising; component; wetted; reacts; contacted; infiltrated; boron nitride; /427/264/

Citation Formats

Corman, Gregory Scot. Porous body infiltrating method. United States: N. p., 2002. Web.
Corman, Gregory Scot. Porous body infiltrating method. United States.
Corman, Gregory Scot. Tue . "Porous body infiltrating method". United States. https://www.osti.gov/servlets/purl/874507.
@article{osti_874507,
title = {Porous body infiltrating method},
author = {Corman, Gregory Scot},
abstractNote = {A mixture is formed that comprises at least some to about 10 wt % boron nitride and silicon. A body comprising a component that is wetted by or reacts with silicon is contacted with the mixture and the contacted body is infiltrated with silicon from the mixture.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {2002},
month = {1}
}

Patent:

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