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Title: Condenser for ring-field deep ultraviolet and extreme ultraviolet lithography

Abstract

A condenser for use with a ring-field deep ultraviolet or extreme ultraviolet lithography system. A condenser includes a ripple-plate mirror which is illuminated by a collimated or converging beam at grazing incidence. The ripple plate comprises a flat or curved plate mirror into which is formed a series of channels along an axis of the mirror to produce a series of concave surfaces in an undulating pattern. Light incident along the channels of the mirror is reflected onto a series of cones. The distribution of slopes on the ripple plate leads to a distribution of angles of reflection of the incident beam. This distribution has the form of an arc, with the extremes of the arc given by the greatest slope in the ripple plate. An imaging mirror focuses this distribution to a ring-field arc at the mask plane.

Inventors:
 [1];  [2]
  1. (Livermore, CA)
  2. (North Fitzroy, AU)
Issue Date:
Research Org.:
Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States)
OSTI Identifier:
874475
Patent Number(s):
6398374
Assignee:
The Regents of the University of California (Oakland, CA) LLNL
DOE Contract Number:  
W-7405-ENG-48
Resource Type:
Patent
Country of Publication:
United States
Language:
English
Subject:
condenser; ring-field; deep; ultraviolet; extreme; lithography; ripple-plate; mirror; illuminated; collimated; converging; beam; grazing; incidence; ripple; plate; flat; curved; formed; series; channels; axis; produce; concave; surfaces; undulating; pattern; light; incident; reflected; cones; distribution; slopes; leads; angles; reflection; form; extremes; slope; imaging; focuses; mask; plane; extreme ultraviolet; concave surface; /359/

Citation Formats

Chapman, Henry N., and Nugent, Keith A. Condenser for ring-field deep ultraviolet and extreme ultraviolet lithography. United States: N. p., 2002. Web.
Chapman, Henry N., & Nugent, Keith A. Condenser for ring-field deep ultraviolet and extreme ultraviolet lithography. United States.
Chapman, Henry N., and Nugent, Keith A. Tue . "Condenser for ring-field deep ultraviolet and extreme ultraviolet lithography". United States. https://www.osti.gov/servlets/purl/874475.
@article{osti_874475,
title = {Condenser for ring-field deep ultraviolet and extreme ultraviolet lithography},
author = {Chapman, Henry N. and Nugent, Keith A.},
abstractNote = {A condenser for use with a ring-field deep ultraviolet or extreme ultraviolet lithography system. A condenser includes a ripple-plate mirror which is illuminated by a collimated or converging beam at grazing incidence. The ripple plate comprises a flat or curved plate mirror into which is formed a series of channels along an axis of the mirror to produce a series of concave surfaces in an undulating pattern. Light incident along the channels of the mirror is reflected onto a series of cones. The distribution of slopes on the ripple plate leads to a distribution of angles of reflection of the incident beam. This distribution has the form of an arc, with the extremes of the arc given by the greatest slope in the ripple plate. An imaging mirror focuses this distribution to a ring-field arc at the mask plane.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {2002},
month = {1}
}

Patent:

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