Title: Method of dehydroxylating a hydroxylated material and method of making a mesoporous film

Abstract

The present invention is a method of dehydroxylating a silica surface that is hydroxylated having the steps of exposing the silica surface separately to a silicon organic compound and a dehydroxylating gas. Exposure to the silicon organic compound can be in liquid, gas or solution phase, and exposure to a dehydroxylating gas is typically at elevated temperatures. In one embodiment, the improvement of the dehydroxylation procedure is the repetition of the soaking and dehydroxylating gas exposure. In another embodiment, the improvement is the use of an inert gas that is substantially free of hydrogen. In yet another embodiment, the present invention is the combination of the two-step dehydroxylation method with a surfactant templating method of making a mesoporous film.

Inventors:

Domansky, Karel ^[1]; Fryxell, Glen E ^[2]; Liu, Jun ^[3]; Kohler, Nathan J ^[1]; Baskaran, Suresh ^[2]

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1. Richland, WA
2. Kennewick, WA
3. West Richland, WA

Issue Date:

2002-05-07

Research Org.:

Pacific Northwest National Laboratory (PNNL), Richland, WA (United States)

Sponsoring Org.:

USDOE

OSTI Identifier:

874403

Patent Number(s):

6383466

Assignee:

Battelle Memorial Institute (Richland, WA)

Patent Classifications (CPCs):

C - CHEMISTRY C01 - INORGANIC CHEMISTRY C01B - NON-METALLIC ELEMENTS

H - ELECTRICITY H01 - BASIC ELECTRIC ELEMENTS H01L - SEMICONDUCTOR DEVICES

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C - CHEMISTRY C01 - INORGANIC CHEMISTRY C01B - NON-METALLIC ELEMENTS

C01B37/02 - Crystalline silica-polymorphs, e.g. silicalites {dealuminated aluminosilicate zeolites}

H - ELECTRICITY H01 - BASIC ELECTRIC ELEMENTS H01L - SEMICONDUCTOR DEVICES

H01L21/02164 - {the material being a silicon oxide, e.g. SiO2}
H01L21/02203 - {the layer being porous}
H01L21/02282 - {liquid deposition, e.g. spin-coating, sol-gel techniques, spray coating}
H01L21/02318 - {post-treatment}
H01L21/02337 - {treatment by exposure to a gas or vapour}
H01L21/31695 - {Deposition of porous oxides or porous glassy oxides or oxide based porous glass}

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DOE Contract Number:  

AC06-76RL01830

Resource Type:

Patent

Country of Publication:

United States

Language:

English

Subject:

method; dehydroxylating; hydroxylated; material; mesoporous; film; silica; surface; steps; exposing; separately; silicon; organic; compound; gas; exposure; liquid; solution; phase; typically; elevated; temperatures; embodiment; improvement; dehydroxylation; procedure; repetition; soaking; inert; substantially; free; hydrogen; combination; two-step; surfactant; templating; inert gas; elevated temperature; substantially free; organic compound; porous film; /423/516/