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Title: Method of dehydroxylating a hydroxylated material and method of making a mesoporous film

Abstract

The present invention is a method of dehydroxylating a silica surface that is hydroxylated having the steps of exposing the silica surface separately to a silicon organic compound and a dehydroxylating gas. Exposure to the silicon organic compound can be in liquid, gas or solution phase, and exposure to a dehydroxylating gas is typically at elevated temperatures. In one embodiment, the improvement of the dehydroxylation procedure is the repetition of the soaking and dehydroxylating gas exposure. In another embodiment, the improvement is the use of an inert gas that is substantially free of hydrogen. In yet another embodiment, the present invention is the combination of the two-step dehydroxylation method with a surfactant templating method of making a mesoporous film.

Inventors:
 [1];  [2];  [3];  [1];  [2]
  1. Richland, WA
  2. Kennewick, WA
  3. West Richland, WA
Issue Date:
Research Org.:
Pacific Northwest National Lab. (PNNL), Richland, WA (United States)
Sponsoring Org.:
USDOE
OSTI Identifier:
874403
Patent Number(s):
6,383,466
Assignee:
Battelle Memorial Institute (Richland, WA) PNNL
DOE Contract Number:  
AC06-76RL01830
Resource Type:
Patent
Country of Publication:
United States
Language:
English
Subject:
method; dehydroxylating; hydroxylated; material; mesoporous; film; silica; surface; steps; exposing; separately; silicon; organic; compound; gas; exposure; liquid; solution; phase; typically; elevated; temperatures; embodiment; improvement; dehydroxylation; procedure; repetition; soaking; inert; substantially; free; hydrogen; combination; two-step; surfactant; templating; inert gas; elevated temperature; substantially free; organic compound; porous film; /423/516/

Citation Formats

Domansky, Karel, Fryxell, Glen E, Liu, Jun, Kohler, Nathan J, and Baskaran, Suresh. Method of dehydroxylating a hydroxylated material and method of making a mesoporous film. United States: N. p., 2002. Web.
Domansky, Karel, Fryxell, Glen E, Liu, Jun, Kohler, Nathan J, & Baskaran, Suresh. Method of dehydroxylating a hydroxylated material and method of making a mesoporous film. United States.
Domansky, Karel, Fryxell, Glen E, Liu, Jun, Kohler, Nathan J, and Baskaran, Suresh. Tue . "Method of dehydroxylating a hydroxylated material and method of making a mesoporous film". United States. https://www.osti.gov/servlets/purl/874403.
@article{osti_874403,
title = {Method of dehydroxylating a hydroxylated material and method of making a mesoporous film},
author = {Domansky, Karel and Fryxell, Glen E and Liu, Jun and Kohler, Nathan J and Baskaran, Suresh},
abstractNote = {The present invention is a method of dehydroxylating a silica surface that is hydroxylated having the steps of exposing the silica surface separately to a silicon organic compound and a dehydroxylating gas. Exposure to the silicon organic compound can be in liquid, gas or solution phase, and exposure to a dehydroxylating gas is typically at elevated temperatures. In one embodiment, the improvement of the dehydroxylation procedure is the repetition of the soaking and dehydroxylating gas exposure. In another embodiment, the improvement is the use of an inert gas that is substantially free of hydrogen. In yet another embodiment, the present invention is the combination of the two-step dehydroxylation method with a surfactant templating method of making a mesoporous film.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {2002},
month = {5}
}

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