3-D photo-patterning of refractive index structures in photosensitive thin film materials

Potter, Kelly Simmons

Title: 3-D photo-patterning of refractive index structures in photosensitive thin film materials

Abstract

A method of making a three-dimensional refractive index structure in a photosensitive material using photo-patterning. The wavelengths at which a photosensitive material exhibits a change in refractive index upon exposure to optical radiation is first determined and then a portion of the surface of the photosensitive material is optically irradiated at a wavelength at which the photosensitive material exhibits a change in refractive index using a designed illumination system to produce a three-dimensional refractive index structure. The illumination system can be a micro-lenslet array, a macroscopic refractive lens array, or a binary optic phase mask. The method is a single-step, direct-write procedure to produce a designed refractive index structure.

Inventors:

Potter, Jr., Barrett George ^[1]; Potter, Kelly Simmons ^[2]

(Albuquerque, NM)
Albuquerque, NM

Issue Date:: 2002-01-01

Research Org.:: Sandia National Laboratories (SNL), Albuquerque, NM, and Livermore, CA (United States)

OSTI Identifier:: 874333

Patent Number(s):: 6368775

Assignee:: Sandia Corporation (Albuquerque, NM)

Patent Classifications (CPCs):: G - PHYSICS G02 - OPTICS G02B - OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS

G - PHYSICS G03 - PHOTOGRAPHY G03F - PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES

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G - PHYSICS G02 - OPTICS G02B - OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
G02B6/13 - Integrated optical circuits characterised by the manufacturing method

G - PHYSICS G03 - PHOTOGRAPHY G03F - PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES
G03F7/001 - {Phase modulating patterns, e.g. refractive index patterns}

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DOE Contract Number:: AC04-94AL85000

Resource Type:: Patent

Country of Publication:: United States

Language:: English

Subject:: 3-d; photo-patterning; refractive; index; structures; photosensitive; film; materials; method; three-dimensional; structure; material; wavelengths; exhibits; change; exposure; optical; radiation; determined; portion; surface; optically; irradiated; wavelength; designed; illumination; produce; micro-lenslet; array; macroscopic; lens; binary; optic; phase; mask; single-step; direct-write; procedure; refractive index; film material; sensitive material; photosensitive material; /430/385/

Citation Formats


                    Potter, Jr., Barrett George, and Potter, Kelly Simmons. 3-D photo-patterning of refractive index structures in photosensitive thin film materials.  United States: N. p., 2002. 
        Web.

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                    Potter, Jr., Barrett George, & Potter, Kelly Simmons. 3-D photo-patterning of refractive index structures in photosensitive thin film materials.  United States.

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                    Potter, Jr., Barrett George, and Potter, Kelly Simmons. Tue .  
        "3-D photo-patterning of refractive index structures in photosensitive thin film materials".  United States.  https://www.osti.gov/servlets/purl/874333.

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@article{osti_874333,

  title        = {3-D photo-patterning of refractive index structures in photosensitive thin film materials},

  author       = {Potter, Jr., Barrett George and Potter, Kelly Simmons},

  abstractNote = {A method of making a three-dimensional refractive index structure in a photosensitive material using photo-patterning. The wavelengths at which a photosensitive material exhibits a change in refractive index upon exposure to optical radiation is first determined and then a portion of the surface of the photosensitive material is optically irradiated at a wavelength at which the photosensitive material exhibits a change in refractive index using a designed illumination system to produce a three-dimensional refractive index structure. The illumination system can be a micro-lenslet array, a macroscopic refractive lens array, or a binary optic phase mask. The method is a single-step, direct-write procedure to produce a designed refractive index structure.},

  doi          = {},

  journal      = {},
number       = ,

  volume       = ,

  place        = {United States},

  year         = {2002},

  month        = {1}

}

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Works referenced in this record:

One-step 3D shaping using a gray-tone mask for optical and microelectronic applications
journal, January 1994

Oppliger, Y.; Sixt, P.; Stauffer, J. M.
Microelectronic Engineering, Vol. 23, Issue 1-4
https://doi.org/10.1016/0167-9317(94)90193-7

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Title: 3-D photo-patterning of refractive index structures in photosensitive thin film materials

Abstract

Citation Formats

One-step 3D shaping using a gray-tone mask for optical and microelectronic applications journal, January 1994

One-step 3D shaping using a gray-tone mask for optical and microelectronic applications
journal, January 1994