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Title: Mitigation of substrate defects in reticles using multilayer buffer layers

Abstract

A multilayer film is used as a buffer layer to minimize the size of defects on a reticle substrate prior to deposition of a reflective coating on the substrate. The multilayer buffer layer deposited intermediate the reticle substrate and the reflective coating produces a smoothing of small particles and other defects on the reticle substrate. The reduction in defect size is controlled by surface relaxation during the buffer layer growth process and by the degree of intermixing and volume contraction of the materials at the multilayer interfaces. The buffer layers are deposited at near-normal incidence via a low particulate ion beam sputtering process. The growth surface of the buffer layer may also be heated by a secondary ion source to increase the degree of intermixing and improve the mitigation of defects.

Inventors:
 [1];  [2];  [3]
  1. (Sunol, CA)
  2. (Livermore, CA)
  3. (Los Altos, CA)
Issue Date:
Research Org.:
Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States)
OSTI Identifier:
874130
Patent Number(s):
6319635
Assignee:
The Regents of the University of California (Oakland, CA) LLNL
DOE Contract Number:  
W-7405-ENG-48
Resource Type:
Patent
Country of Publication:
United States
Language:
English
Subject:
mitigation; substrate; defects; reticles; multilayer; buffer; layers; film; layer; minimize; size; reticle; prior; deposition; reflective; coating; deposited; intermediate; produces; smoothing; particles; reduction; defect; controlled; surface; relaxation; growth; process; degree; intermixing; volume; contraction; materials; interfaces; near-normal; incidence; via; particulate; beam; sputtering; heated; secondary; source; increase; improve; buffer layer; layer deposited; reflective coating; multilayer film; substrate prior; /430/378/

Citation Formats

Mirkarimi, Paul B., Bajt, Sasa, and Stearns, Daniel G. Mitigation of substrate defects in reticles using multilayer buffer layers. United States: N. p., 2001. Web.
Mirkarimi, Paul B., Bajt, Sasa, & Stearns, Daniel G. Mitigation of substrate defects in reticles using multilayer buffer layers. United States.
Mirkarimi, Paul B., Bajt, Sasa, and Stearns, Daniel G. Mon . "Mitigation of substrate defects in reticles using multilayer buffer layers". United States. https://www.osti.gov/servlets/purl/874130.
@article{osti_874130,
title = {Mitigation of substrate defects in reticles using multilayer buffer layers},
author = {Mirkarimi, Paul B. and Bajt, Sasa and Stearns, Daniel G.},
abstractNote = {A multilayer film is used as a buffer layer to minimize the size of defects on a reticle substrate prior to deposition of a reflective coating on the substrate. The multilayer buffer layer deposited intermediate the reticle substrate and the reflective coating produces a smoothing of small particles and other defects on the reticle substrate. The reduction in defect size is controlled by surface relaxation during the buffer layer growth process and by the degree of intermixing and volume contraction of the materials at the multilayer interfaces. The buffer layers are deposited at near-normal incidence via a low particulate ion beam sputtering process. The growth surface of the buffer layer may also be heated by a secondary ion source to increase the degree of intermixing and improve the mitigation of defects.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {2001},
month = {1}
}

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