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Title: High numerical aperture ring field projection system for extreme ultraviolet lithography

Abstract

An all-reflective optical system for a projection photolithography camera has a source of EUV radiation, a wafer and a mask to be imaged on the wafer. The optical system includes a first concave mirror, a second mirror, a third convex mirror, a fourth concave mirror, a fifth convex mirror and a sixth concave mirror. The system is configured such that five of the six mirrors receives a chief ray at an incidence angle of less than substantially 12.degree., and each of the six mirrors receives a chief ray at an incidence angle of less than substantially 15.degree.. Four of the six reflecting surfaces have an aspheric departure of less than substantially 7 .mu.m. Five of the six reflecting surfaces have an aspheric departure of less than substantially 14 .mu.m. Each of the six reflecting surfaces has an aspheric departure of less than 16.0 .mu.m.

Inventors:
 [1]
  1. (218 Eastridge Dr., San Ramon, CA 94583-4905)
Issue Date:
Research Org.:
Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States)
OSTI Identifier:
874124
Patent Number(s):
6318869
Assignee:
Hudyma; Russell (218 Eastridge Dr., San Ramon, CA 94583-4905) LLNL
DOE Contract Number:  
W-7405-ENG-48
Resource Type:
Patent
Country of Publication:
United States
Language:
English
Subject:
numerical; aperture; field; projection; extreme; ultraviolet; lithography; all-reflective; optical; photolithography; camera; source; euv; radiation; wafer; mask; imaged; concave; mirror; third; convex; fourth; fifth; sixth; configured; five; six; mirrors; receives; chief; ray; incidence; angle; substantially; 12degree; 15degree; reflecting; surfaces; aspheric; departure; mum; 14; 160; extreme ultraviolet; reflecting surface; incidence angle; all-reflective optical; projection photolithography; photolithography camera; field projection; /359/

Citation Formats

Hudyma, Russell. High numerical aperture ring field projection system for extreme ultraviolet lithography. United States: N. p., 2001. Web.
Hudyma, Russell. High numerical aperture ring field projection system for extreme ultraviolet lithography. United States.
Hudyma, Russell. Mon . "High numerical aperture ring field projection system for extreme ultraviolet lithography". United States. https://www.osti.gov/servlets/purl/874124.
@article{osti_874124,
title = {High numerical aperture ring field projection system for extreme ultraviolet lithography},
author = {Hudyma, Russell},
abstractNote = {An all-reflective optical system for a projection photolithography camera has a source of EUV radiation, a wafer and a mask to be imaged on the wafer. The optical system includes a first concave mirror, a second mirror, a third convex mirror, a fourth concave mirror, a fifth convex mirror and a sixth concave mirror. The system is configured such that five of the six mirrors receives a chief ray at an incidence angle of less than substantially 12.degree., and each of the six mirrors receives a chief ray at an incidence angle of less than substantially 15.degree.. Four of the six reflecting surfaces have an aspheric departure of less than substantially 7 .mu.m. Five of the six reflecting surfaces have an aspheric departure of less than substantially 14 .mu.m. Each of the six reflecting surfaces has an aspheric departure of less than 16.0 .mu.m.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {2001},
month = {1}
}

Patent:

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