DOE Patents title logo U.S. Department of Energy
Office of Scientific and Technical Information

Title: Diffractive element in extreme-UV lithography condenser

Abstract

Condensers having a mirror with a diffraction grating in projection lithography using extreme ultra-violet significantly enhances critical dimension control. The diffraction grating has the effect of smoothing the illumination at the camera's entrance pupil with minimum light loss. Modeling suggests that critical dimension control for 100 nm features can be improved from 3 nm to less than about 0.5 nm.

Inventors:
 [1];  [2]
  1. Albuquerque, NM
  2. Livermore, CA
Issue Date:
Research Org.:
Sandia National Laboratories (SNL), Albuquerque, NM, and Livermore, CA (United States)
OSTI Identifier:
873972
Patent Number(s):
6285497
Assignee:
EUV LLC (Santa Clara, CA)
Patent Classifications (CPCs):
Y - NEW / CROSS SECTIONAL TECHNOLOGIES Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC Y10S - TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
G - PHYSICS G03 - PHOTOGRAPHY G03F - PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES
DOE Contract Number:  
AC04-94AL85000
Resource Type:
Patent
Country of Publication:
United States
Language:
English
Subject:
diffractive; element; extreme-uv; lithography; condenser; condensers; mirror; diffraction; grating; projection; extreme; ultra-violet; significantly; enhances; critical; dimension; control; effect; smoothing; illumination; camera; entrance; pupil; minimum; light; loss; modeling; suggests; 100; nm; features; improved; extreme-uv lithography; projection lithography; entrance pupil; diffraction grating; critical dimension; diffractive element; active element; lithography condenser; extreme ultra-violet; dimension control; light loss; significantly enhances; ultra-violet significantly; enhances critical; /359/378/355/

Citation Formats

Sweatt, William C, and Ray-Chaudhuri, Avijit. Diffractive element in extreme-UV lithography condenser. United States: N. p., 2001. Web.
Sweatt, William C, & Ray-Chaudhuri, Avijit. Diffractive element in extreme-UV lithography condenser. United States.
Sweatt, William C, and Ray-Chaudhuri, Avijit. Mon . "Diffractive element in extreme-UV lithography condenser". United States. https://www.osti.gov/servlets/purl/873972.
@article{osti_873972,
title = {Diffractive element in extreme-UV lithography condenser},
author = {Sweatt, William C and Ray-Chaudhuri, Avijit},
abstractNote = {Condensers having a mirror with a diffraction grating in projection lithography using extreme ultra-violet significantly enhances critical dimension control. The diffraction grating has the effect of smoothing the illumination at the camera's entrance pupil with minimum light loss. Modeling suggests that critical dimension control for 100 nm features can be improved from 3 nm to less than about 0.5 nm.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {2001},
month = {1}
}

Works referenced in this record:

Electron-beam-deposited Mo/Si and MoxSiy/Si multilayer x-ray mirrors and gratings
journal, April 1994


Reflective systems design study for soft x-ray projection lithography
journal, November 1990


New optics design methodology using diffraction grating on spherical mirrors for soft x-ray projection lithography
journal, March 1995


EUV optical design for a 100-nm CD imaging system
conference, June 1998

  • Sweeney, Donald W.; Hudyma, Russell M.; Chapman, Henry N.
  • 23rd Annual International Symposium on Microlithography, SPIE Proceedings
  • https://doi.org/10.1117/12.309559