skip to main content
DOE Patents title logo U.S. Department of Energy
Office of Scientific and Technical Information

Title: Diffractive element in extreme-UV lithography condenser

Abstract

Condensers having a mirror with a diffraction grating in projection lithography using extreme ultra-violet significantly enhances critical dimension control. The diffraction grating has the effect of smoothing the illumination at the camera's entrance pupil with minimum light loss. Modeling suggests that critical dimension control for 100 nm features can be improved from 3 nm to less than about 0.5 nm.

Inventors:
 [1];  [2]
  1. (Albuquerque, NM)
  2. (Livermore, CA)
Issue Date:
Research Org.:
SANDIA CORP
OSTI Identifier:
873972
Patent Number(s):
6285497
Assignee:
EUV LLC (Santa Clara, CA) SNL
DOE Contract Number:  
AC04-94AL85000
Resource Type:
Patent
Country of Publication:
United States
Language:
English
Subject:
diffractive; element; extreme-uv; lithography; condenser; condensers; mirror; diffraction; grating; projection; extreme; ultra-violet; significantly; enhances; critical; dimension; control; effect; smoothing; illumination; camera; entrance; pupil; minimum; light; loss; modeling; suggests; 100; nm; features; improved; extreme-uv lithography; projection lithography; entrance pupil; diffraction grating; critical dimension; diffractive element; active element; lithography condenser; extreme ultra-violet; dimension control; light loss; significantly enhances; ultra-violet significantly; enhances critical; /359/378/355/

Citation Formats

Sweatt, William C., and Ray-Chaudhuri, Avijit. Diffractive element in extreme-UV lithography condenser. United States: N. p., 2001. Web.
Sweatt, William C., & Ray-Chaudhuri, Avijit. Diffractive element in extreme-UV lithography condenser. United States.
Sweatt, William C., and Ray-Chaudhuri, Avijit. Mon . "Diffractive element in extreme-UV lithography condenser". United States. https://www.osti.gov/servlets/purl/873972.
@article{osti_873972,
title = {Diffractive element in extreme-UV lithography condenser},
author = {Sweatt, William C. and Ray-Chaudhuri, Avijit},
abstractNote = {Condensers having a mirror with a diffraction grating in projection lithography using extreme ultra-violet significantly enhances critical dimension control. The diffraction grating has the effect of smoothing the illumination at the camera's entrance pupil with minimum light loss. Modeling suggests that critical dimension control for 100 nm features can be improved from 3 nm to less than about 0.5 nm.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {2001},
month = {1}
}

Patent:

Save / Share: