Phase-shifting point diffraction interferometer phase grating designs
Abstract
Diffraction phase gratings are employed in phase-shifting point diffraction interferometers to improve the interferometric fringe contrast. The diffraction phase grating diffracts a zeroth-order diffraction of light at a first power level to the test-beam window of a mask that is positioned at the image plane and a first-order diffraction at a second power to the reference-beam pinhole. The diffraction phase grating is preferably selected to yield a desired ratio of the first power level to second power level.
- Inventors:
-
- Oakland, CA
- Issue Date:
- Research Org.:
- Lawrence Berkeley National Laboratory (LBNL), Berkeley, CA (United States)
- OSTI Identifier:
- 873886
- Patent Number(s):
- 6266147
- Assignee:
- Regents of University of California (Oakland, CA)
- Patent Classifications (CPCs):
-
G - PHYSICS G01 - MEASURING G01B - MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS
- DOE Contract Number:
- AC03-76SF00098
- Resource Type:
- Patent
- Country of Publication:
- United States
- Language:
- English
- Subject:
- phase-shifting; diffraction; interferometer; phase; grating; designs; gratings; employed; interferometers; improve; interferometric; fringe; contrast; diffracts; zeroth-order; light; power; level; test-beam; window; mask; positioned; image; plane; first-order; reference-beam; pinhole; preferably; selected; yield; desired; ratio; image plane; diffraction interferometer; power level; beam window; phase grating; preferably selected; fringe contrast; desired ratio; diffraction phase; zeroth-order diffraction; grating designs; first-order diffraction; /356/
Citation Formats
Naulleau, Patrick. Phase-shifting point diffraction interferometer phase grating designs. United States: N. p., 2001.
Web.
Naulleau, Patrick. Phase-shifting point diffraction interferometer phase grating designs. United States.
Naulleau, Patrick. Mon .
"Phase-shifting point diffraction interferometer phase grating designs". United States. https://www.osti.gov/servlets/purl/873886.
@article{osti_873886,
title = {Phase-shifting point diffraction interferometer phase grating designs},
author = {Naulleau, Patrick},
abstractNote = {Diffraction phase gratings are employed in phase-shifting point diffraction interferometers to improve the interferometric fringe contrast. The diffraction phase grating diffracts a zeroth-order diffraction of light at a first power level to the test-beam window of a mask that is positioned at the image plane and a first-order diffraction at a second power to the reference-beam pinhole. The diffraction phase grating is preferably selected to yield a desired ratio of the first power level to second power level.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {Mon Jan 01 00:00:00 EST 2001},
month = {Mon Jan 01 00:00:00 EST 2001}
}
Works referenced in this record:
Electron beam lithography digital pattern generator and electronics for generalized curvilinear structures
journal, November 1995
- Anderson, Erik H.
- Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, Vol. 13, Issue 6
Phase-shifting point diffraction interferometer
journal, January 1996
- Medecki, H.; Tejnil, E.; Goldberg, K. A.
- Optics Letters, Vol. 21, Issue 19
Phase-measuring interferometry using extreme ultraviolet radiation
journal, November 1995
- Bjorkholm, J. E.
- Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, Vol. 13, Issue 6
Effect of intensity error correlation on the computed phase of phase-shifting interferometry
journal, January 1990
- Brophy, Chris P.
- Journal of the Optical Society of America A, Vol. 7, Issue 4
Characterization of the accuracy of EUV phase-shifting point diffraction interferometry
conference, June 1998
- Naulleau, Patrick P.; Goldberg, Kenneth A.; Lee, Sang Hun
- 23rd Annual International Symposium on Microlithography, SPIE Proceedings