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Title: Method for applying a barrier layer to a silicon based substrate

Abstract

A method for applying a barrier layer which comprises a barium-strontium aluminosilicate to a silicon containing substrate which inhibits the formation of cracks.

Inventors:
 [1];  [2]
  1. Woodstock, CT
  2. Wethersfield, CT
Issue Date:
Research Org.:
SOLAR TURBINES INC
OSTI Identifier:
873821
Patent Number(s):
6254935
Assignee:
United Technologies Corporation (Hartford, CT)
Patent Classifications (CPCs):
C - CHEMISTRY C04 - CEMENTS C04B - LIME, MAGNESIA
C - CHEMISTRY C23 - COATING METALLIC MATERIAL C23C - COATING METALLIC MATERIAL
DOE Contract Number:  
AC02-92CE40960
Resource Type:
Patent
Country of Publication:
United States
Language:
English
Subject:
method; applying; barrier; layer; silicon; based; substrate; comprises; barium-strontium; aluminosilicate; containing; inhibits; formation; cracks; silicon based; barrier layer; silicon containing; containing substrate; /427/

Citation Formats

Eaton, Harry E, and Lawton, Thomas H. Method for applying a barrier layer to a silicon based substrate. United States: N. p., 2001. Web.
Eaton, Harry E, & Lawton, Thomas H. Method for applying a barrier layer to a silicon based substrate. United States.
Eaton, Harry E, and Lawton, Thomas H. Mon . "Method for applying a barrier layer to a silicon based substrate". United States. https://www.osti.gov/servlets/purl/873821.
@article{osti_873821,
title = {Method for applying a barrier layer to a silicon based substrate},
author = {Eaton, Harry E and Lawton, Thomas H},
abstractNote = {A method for applying a barrier layer which comprises a barium-strontium aluminosilicate to a silicon containing substrate which inhibits the formation of cracks.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {2001},
month = {1}
}

Patent:

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