Sealable stagnation flow geometries for the uniform deposition of materials and heat

McCarty, Kevin F; Kee, Robert J; Lutz, Andrew E; Meeks, Ellen

Title: Sealable stagnation flow geometries for the uniform deposition of materials and heat

Full Record
Other Related Research

Abstract

The present invention employs a constrained stagnation flow geometry apparatus to achieve the uniform deposition of materials or heat. The present invention maximizes uniform fluxes of reactant gases to flat surfaces while minimizing the use of reagents and finite dimension edge effects. This results, among other things, in large area continuous films that are uniform in thickness, composition and structure which is important in chemical vapor deposition processes such as would be used for the fabrication of semiconductors.

Inventors:

McCarty, Kevin F ^[1]; Kee, Robert J ^[1]; Lutz, Andrew E ^[2]; Meeks, Ellen ^[1]

Livermore, CA
Alamo, CA

Issue Date:: 2001-01-01

Research Org.:: Sandia National Laboratories (SNL), Albuquerque, NM, and Livermore, CA (United States)

OSTI Identifier:: 873769

Patent Number(s):: 6242049

Assignee:: Sandia Corporation (Livermore, CA)

Patent Classifications (CPCs):: C - CHEMISTRY C23 - COATING METALLIC MATERIAL C23C - COATING METALLIC MATERIAL

Show more

C - CHEMISTRY C23 - COATING METALLIC MATERIAL C23C - COATING METALLIC MATERIAL
C23C16/275 - {using combustion torches}
C23C16/455 - characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
C23C16/45504 - {Laminar flow}
C23C16/45508 - {Radial flow}
C23C16/45572 - {Cooled nozzles}

Show less

DOE Contract Number:: AC04-94AL85000

Resource Type:: Patent

Country of Publication:: United States

Language:: English

Subject:: sealable; stagnation; flow; geometries; uniform; deposition; materials; heat; employs; constrained; geometry; apparatus; achieve; maximizes; fluxes; reactant; gases; flat; surfaces; minimizing; reagents; finite; dimension; edge; effects; results; continuous; films; thickness; composition; structure; chemical; vapor; processes; fabrication; semiconductors; stagnation flow; reactant gases; chemical vapor; vapor deposition; deposition process; reactant gas; deposition processes; uniform deposition; edge effects; flat surface; flow geometries; finite dimension; uniform deposit; continuous film; /427/

Citation Formats


                    McCarty, Kevin F, Kee, Robert J, Lutz, Andrew E, and Meeks, Ellen. Sealable stagnation flow geometries for the uniform deposition of materials and heat.  United States: N. p., 2001. 
        Web.

Copy to clipboard


                    McCarty, Kevin F, Kee, Robert J, Lutz, Andrew E, & Meeks, Ellen. Sealable stagnation flow geometries for the uniform deposition of materials and heat.  United States.

Copy to clipboard


                    McCarty, Kevin F, Kee, Robert J, Lutz, Andrew E, and Meeks, Ellen. Mon .  
        "Sealable stagnation flow geometries for the uniform deposition of materials and heat".  United States.  https://www.osti.gov/servlets/purl/873769.

Copy to clipboard


                    
@article{osti_873769,

  title        = {Sealable stagnation flow geometries for the uniform deposition of materials and heat},

  author       = {McCarty, Kevin F and Kee, Robert J and Lutz, Andrew E and Meeks, Ellen},

  abstractNote = {The present invention employs a constrained stagnation flow geometry apparatus to achieve the uniform deposition of materials or heat. The present invention maximizes uniform fluxes of reactant gases to flat surfaces while minimizing the use of reagents and finite dimension edge effects. This results, among other things, in large area continuous films that are uniform in thickness, composition and structure which is important in chemical vapor deposition processes such as would be used for the fabrication of semiconductors.},

  doi          = {},

  journal      = {},
number       = ,

  volume       = ,

  place        = {United States},

  year         = {2001},

  month        = {1}

}

Copy to clipboard

Patent:

Save / Share:

Export Metadata

Save to My Library

Similar Records in DOE Patents and OSTI.GOV collections:

Method for depositing a uniform layer of particulate material on the surface of an article having interconnected porosity

Patent Wrenn, Jr., George E. (Clinton, TN); Lewis, Jr., John (Oak Ridge, TN)

The invention is a method for depositing liquid-suspended particles on an immersed porous article characterized by interconnected porosity. In one form of the invention, coating is conducted in a vessel containing an organic liquid supporting a colloidal dispersion of graphite sized to lodge in surface pores of the article. The liquid comprises a first volatile component (e.g., acetone) and a second less-volatile component (e.g., toluene) containing a dissolved organic graphite-bonding agent. The liquid also contains an organic agent (e.g., cellulose gum) for maintaining the particles in suspension. A porous carbon article to be coated is immersed in the liquid somore » « less
Full Text Available
Low pressure stagnation flow reactor with a flow barrier

Patent Vosen, Steven R [1306 Evelyn Ave., Berkeley, CA 94702]

A flow barrier disposed at the periphery of a workpiece for achieving uniform reaction across the surface of the workpiece, such as a semiconductor wafer, in a stagnation flow reactor operating under the conditions of a low pressure or low flow rate. The flow barrier is preferably in the shape of annulus and can include within the annular structure passages or flow channels for directing a secondary flow of gas substantially at the surface of a semiconductor workpiece. The flow barrier can be constructed of any material which is chemically inert to reactive gases flowing over the surface of themore » semiconductor workpiece. « less
Full Text Available
Method of growing films by flame synthesis using a stagnation-flow reactor

Patent Hahn, David W [Dublin, CA]; Edwards, Christopher F [Sunnyvale, CA]

A method of stabilizing a strained flame in a stagnation flow reactor. By causing a highly strained flame to be divided into a large number of equal size segments it is possible to stablize a highly strained flame that is on the verge of extinction, thereby providing for higher film growth rates. The flame stabilizer is an annular ring mounted coaxially and coplanar with the substrate upon which the film is growing and having a number of vertical pillars mounted on the top surface, thereby increasing the number of azimuthal nodes into which the flame is divided and preserving anmore » « less
Full Text Available
Flame stabilizer for stagnation flow reactor

Patent Hahn, David W [Dublin, CA]; Edwards, Christopher F [Sunnyvale, CA]

A method of stabilizing a strained flame in a stagnation flow reactor. By causing a highly strained flame to be divided into a large number of equal size segments it is possible to stablize a highly strained flame that is on the verge of extinction, thereby providing for higher film growth rates. The flame stabilizer is an annular ring mounted coaxially and coplanar with the substrate upon which the film is growing and having a number of vertical pillars mounted on the top surface, thereby increasing the number of azimuthal nodes into which the flame is divided and preserving anmore » « less
Full Text Available
Dye laser amplifier including a low turbulence, stagnation-free dye flow configuration

Patent Davin, James [Gilroy, CA]

A large (high flow rate) dye laser amplifier in which a continuous replenished supply of dye is excited by a first light beam, specifically a copper vapor laser beam, in order to amplify the intensity of a second different light beam, specifically a dye beam, passing through the dye is disclosed herein. This amplifier includes a dye cell defining a dye chamber through which a continuous stream of dye is caused to pass at a flow rate of for example 30 gallons/minute, a specifically designed support vessel for containing the dye cell and a screen device for insuring that themore » « less
Full Text Available

Similar Records