Interferometric at-wavelength flare characterization of EUV optical systems
Abstract
The extreme ultraviolet (EUV) phase-shifting point diffraction interferometer (PS/PDI) provides the high-accuracy wavefront characterization critical to the development of EUV lithography systems. Enhancing the implementation of the PS/PDI can significantly extend its spatial-frequency measurement bandwidth. The enhanced PS/PDI is capable of simultaneously characterizing both wavefront and flare. The enhanced technique employs a hybrid spatial/temporal-domain point diffraction interferometer (referred to as the dual-domain PS/PDI) that is capable of suppressing the scattered-reference-light noise that hinders the conventional PS/PDI. Using the dual-domain technique in combination with a flare-measurement-optimized mask and an iterative calculation process for removing flare contribution caused by higher order grating diffraction terms, the enhanced PS/PDI can be used to simultaneously measure both figure and flare in optical systems.
- Inventors:
-
- Oakland, CA
- Berkeley, CA
- Issue Date:
- Research Org.:
- Lawrence Berkeley National Laboratory (LBNL), Berkeley, CA (United States)
- OSTI Identifier:
- 873741
- Patent Number(s):
- 6233056
- Assignee:
- Regents of University of California (Oakland, CA)
- Patent Classifications (CPCs):
-
G - PHYSICS G03 - PHOTOGRAPHY G03F - PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES
- DOE Contract Number:
- AC03-76SF00098
- Resource Type:
- Patent
- Country of Publication:
- United States
- Language:
- English
- Subject:
- interferometric; at-wavelength; flare; characterization; euv; optical; systems; extreme; ultraviolet; phase-shifting; diffraction; interferometer; pdi; provides; high-accuracy; wavefront; critical; lithography; enhancing; implementation; significantly; extend; spatial-frequency; measurement; bandwidth; enhanced; capable; simultaneously; characterizing; technique; employs; hybrid; spatial; temporal-domain; referred; dual-domain; suppressing; scattered-reference-light; noise; hinders; conventional; combination; flare-measurement-optimized; mask; iterative; calculation; process; removing; contribution; caused; grating; terms; measure; figure; frequency measurement; diffraction interferometer; optical systems; extreme ultraviolet; lithography systems; euv optical; scattered-reference-light noise; hybrid spatial; simultaneously measure; /356/
Citation Formats
Naulleau, Patrick P, and Goldberg, Kenneth Alan. Interferometric at-wavelength flare characterization of EUV optical systems. United States: N. p., 2001.
Web.
Naulleau, Patrick P, & Goldberg, Kenneth Alan. Interferometric at-wavelength flare characterization of EUV optical systems. United States.
Naulleau, Patrick P, and Goldberg, Kenneth Alan. Mon .
"Interferometric at-wavelength flare characterization of EUV optical systems". United States. https://www.osti.gov/servlets/purl/873741.
@article{osti_873741,
title = {Interferometric at-wavelength flare characterization of EUV optical systems},
author = {Naulleau, Patrick P and Goldberg, Kenneth Alan},
abstractNote = {The extreme ultraviolet (EUV) phase-shifting point diffraction interferometer (PS/PDI) provides the high-accuracy wavefront characterization critical to the development of EUV lithography systems. Enhancing the implementation of the PS/PDI can significantly extend its spatial-frequency measurement bandwidth. The enhanced PS/PDI is capable of simultaneously characterizing both wavefront and flare. The enhanced technique employs a hybrid spatial/temporal-domain point diffraction interferometer (referred to as the dual-domain PS/PDI) that is capable of suppressing the scattered-reference-light noise that hinders the conventional PS/PDI. Using the dual-domain technique in combination with a flare-measurement-optimized mask and an iterative calculation process for removing flare contribution caused by higher order grating diffraction terms, the enhanced PS/PDI can be used to simultaneously measure both figure and flare in optical systems.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {Mon Jan 01 00:00:00 EST 2001},
month = {Mon Jan 01 00:00:00 EST 2001}
}
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