Projection lithography with distortion compensation using reticle chuck contouring

Tichenor, Daniel A

Title: Projection lithography with distortion compensation using reticle chuck contouring

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Abstract

A chuck for holding a reflective reticle where the chuck has an insulator block with a non-planer surface contoured to cause distortion correction of EUV radiation is provided. Upon being placed on the chuck, a thin, pliable reflective reticle will conform to the contour of the chuck's non-planer surface. When employed in a scanning photolithography system, distortion in the scanned direction is corrected.

Inventors:

Tichenor, Daniel A ^[1]

Castro Valley, CA

Issue Date:: 2001-01-01

Research Org.:: Sandia National Laboratories (SNL), Albuquerque, NM, and Livermore, CA (United States)

OSTI Identifier:: 873721

Patent Number(s):: 6229871

Assignee:: EUV LLC (Santa Clara, CA)

Patent Classifications (CPCs):: G - PHYSICS G03 - PHOTOGRAPHY G03F - PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES

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G - PHYSICS G03 - PHOTOGRAPHY G03F - PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES
G03F7/70283 - {Masks or their effects on the imaging process, e.g. Fourier masks, greyscale masks, holographic masks, phase shift masks, phasemasks, lenticular masks, multiple masks, tilted masks, tandem masks
G03F7/70358 - {Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging}
G03F7/70708 - {being electrostatic
G03F7/707 - {Chucks, e.g. chucking or un-chucking operations
G03F7/703 - {Non-planar pattern area or non-planar masks}

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DOE Contract Number:: AC04-94AL85000

Resource Type:: Patent

Country of Publication:: United States

Language:: English

Subject:: projection; lithography; distortion; compensation; reticle; chuck; contouring; holding; reflective; insulator; block; non-planer; surface; contoured; correction; euv; radiation; provided; placed; pliable; conform; contour; employed; scanning; photolithography; scanned; direction; corrected; projection lithography; surface contour; euv radiation; insulator block; reflective reticle; /378/

Citation Formats


                    Tichenor, Daniel A. Projection lithography with distortion compensation using reticle chuck contouring.  United States: N. p., 2001. 
        Web.

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                    Tichenor, Daniel A. Projection lithography with distortion compensation using reticle chuck contouring.  United States.

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                    Tichenor, Daniel A. Mon .  
        "Projection lithography with distortion compensation using reticle chuck contouring".  United States.  https://www.osti.gov/servlets/purl/873721.

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@article{osti_873721,

  title        = {Projection lithography with distortion compensation using reticle chuck contouring},

  author       = {Tichenor, Daniel A},

  abstractNote = {A chuck for holding a reflective reticle where the chuck has an insulator block with a non-planer surface contoured to cause distortion correction of EUV radiation is provided. Upon being placed on the chuck, a thin, pliable reflective reticle will conform to the contour of the chuck's non-planer surface. When employed in a scanning photolithography system, distortion in the scanned direction is corrected.},

  doi          = {},

  journal      = {},
number       = ,

  volume       = ,

  place        = {United States},

  year         = {2001},

  month        = {1}

}

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