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Title: Projection lithography with distortion compensation using reticle chuck contouring

Abstract

A chuck for holding a reflective reticle where the chuck has an insulator block with a non-planer surface contoured to cause distortion correction of EUV radiation is provided. Upon being placed on the chuck, a thin, pliable reflective reticle will conform to the contour of the chuck's non-planer surface. When employed in a scanning photolithography system, distortion in the scanned direction is corrected.

Inventors:
 [1]
  1. Castro Valley, CA
Issue Date:
Research Org.:
Sandia National Laboratories (SNL), Albuquerque, NM, and Livermore, CA (United States)
OSTI Identifier:
873721
Patent Number(s):
6229871
Assignee:
EUV LLC (Santa Clara, CA)
Patent Classifications (CPCs):
G - PHYSICS G03 - PHOTOGRAPHY G03F - PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES
DOE Contract Number:  
AC04-94AL85000
Resource Type:
Patent
Country of Publication:
United States
Language:
English
Subject:
projection; lithography; distortion; compensation; reticle; chuck; contouring; holding; reflective; insulator; block; non-planer; surface; contoured; correction; euv; radiation; provided; placed; pliable; conform; contour; employed; scanning; photolithography; scanned; direction; corrected; projection lithography; surface contour; euv radiation; insulator block; reflective reticle; /378/

Citation Formats

Tichenor, Daniel A. Projection lithography with distortion compensation using reticle chuck contouring. United States: N. p., 2001. Web.
Tichenor, Daniel A. Projection lithography with distortion compensation using reticle chuck contouring. United States.
Tichenor, Daniel A. Mon . "Projection lithography with distortion compensation using reticle chuck contouring". United States. https://www.osti.gov/servlets/purl/873721.
@article{osti_873721,
title = {Projection lithography with distortion compensation using reticle chuck contouring},
author = {Tichenor, Daniel A},
abstractNote = {A chuck for holding a reflective reticle where the chuck has an insulator block with a non-planer surface contoured to cause distortion correction of EUV radiation is provided. Upon being placed on the chuck, a thin, pliable reflective reticle will conform to the contour of the chuck's non-planer surface. When employed in a scanning photolithography system, distortion in the scanned direction is corrected.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {2001},
month = {1}
}