Extreme-UV lithography condenser
Abstract
Condenser system for use with a ringfield camera in projection lithography where the condenser includes a series of segments of a parent aspheric mirror having one foci at a quasi-point source of radiation and the other foci at the radius of a ringfield have all but one or all of their beams translated and rotated by sets of mirrors such that all of the beams pass through the real entrance pupil of a ringfield camera about one of the beams and fall onto the ringfield radius as a coincident image as an arc of the ringfield. The condenser has a set of correcting mirrors with one of the correcting mirrors of each set, or a mirror that is common to said sets of mirrors, from which the radiation emanates, is a concave mirror that is positioned to shape a beam segment having a chord angle of about 25 to 85 degrees into a second beam segment having a chord angle of about 0 to 60 degrees.
- Inventors:
-
- Albuquerque, NM
- San Ramon, CA
- Fairfield, CT
- Pasadena, CA
- Issue Date:
- Research Org.:
- Sandia National Laboratories (SNL), Albuquerque, NM, and Livermore, CA (United States)
- OSTI Identifier:
- 873643
- Patent Number(s):
- 6210865
- Assignee:
- EUV LLC (Santa Clara, CA)
- Patent Classifications (CPCs):
-
G - PHYSICS G03 - PHOTOGRAPHY G03F - PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES
G - PHYSICS G21 - NUCLEAR PHYSICS G21K - TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR
- DOE Contract Number:
- AC04-94AL85000
- Resource Type:
- Patent
- Country of Publication:
- United States
- Language:
- English
- Subject:
- extreme-uv; lithography; condenser; ringfield; camera; projection; series; segments; parent; aspheric; mirror; foci; quasi-point; source; radiation; radius; beams; translated; rotated; sets; mirrors; pass; entrance; pupil; fall; coincident; image; set; correcting; common; emanates; concave; positioned; shape; beam; segment; chord; angle; 25; 85; degrees; 60; extreme-uv lithography; projection lithography; entrance pupil; concave mirror; beam segment; lithography condenser; beams pass; parent aspheric; ringfield camera; aspheric mirror; si-point source; beams translated; correcting mirror; /430/359/378/
Citation Formats
Sweatt, William C, Sweeney, Donald W, Shafer, David, and McGuire, James. Extreme-UV lithography condenser. United States: N. p., 2001.
Web.
Sweatt, William C, Sweeney, Donald W, Shafer, David, & McGuire, James. Extreme-UV lithography condenser. United States.
Sweatt, William C, Sweeney, Donald W, Shafer, David, and McGuire, James. Mon .
"Extreme-UV lithography condenser". United States. https://www.osti.gov/servlets/purl/873643.
@article{osti_873643,
title = {Extreme-UV lithography condenser},
author = {Sweatt, William C and Sweeney, Donald W and Shafer, David and McGuire, James},
abstractNote = {Condenser system for use with a ringfield camera in projection lithography where the condenser includes a series of segments of a parent aspheric mirror having one foci at a quasi-point source of radiation and the other foci at the radius of a ringfield have all but one or all of their beams translated and rotated by sets of mirrors such that all of the beams pass through the real entrance pupil of a ringfield camera about one of the beams and fall onto the ringfield radius as a coincident image as an arc of the ringfield. The condenser has a set of correcting mirrors with one of the correcting mirrors of each set, or a mirror that is common to said sets of mirrors, from which the radiation emanates, is a concave mirror that is positioned to shape a beam segment having a chord angle of about 25 to 85 degrees into a second beam segment having a chord angle of about 0 to 60 degrees.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {2001},
month = {1}
}
Works referenced in this record:
Electron-beam-deposited Mo/Si and MoxSiy/Si multilayer x-ray mirrors and gratings
journal, April 1994
- Schmiedeskamp, Bernt
- Optical Engineering, Vol. 33, Issue 4
New optics design methodology using diffraction grating on spherical mirrors for soft x-ray projection lithography
journal, March 1995
- Fukuda, Hiroshi
- Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, Vol. 13, Issue 2