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Title: Extreme-UV lithography condenser

Abstract

Condenser system for use with a ringfield camera in projection lithography where the condenser includes a series of segments of a parent aspheric mirror having one foci at a quasi-point source of radiation and the other foci at the radius of a ringfield have all but one or all of their beams translated and rotated by sets of mirrors such that all of the beams pass through the real entrance pupil of a ringfield camera about one of the beams and fall onto the ringfield radius as a coincident image as an arc of the ringfield. The condenser has a set of correcting mirrors with one of the correcting mirrors of each set, or a mirror that is common to said sets of mirrors, from which the radiation emanates, is a concave mirror that is positioned to shape a beam segment having a chord angle of about 25 to 85 degrees into a second beam segment having a chord angle of about 0 to 60 degrees.

Inventors:
 [1];  [2];  [3];  [4]
  1. (Albuquerque, NM)
  2. (San Ramon, CA)
  3. (Fairfield, CT)
  4. (Pasadena, CA)
Issue Date:
Research Org.:
SANDIA CORP
OSTI Identifier:
873643
Patent Number(s):
6210865
Assignee:
EUV LLC (Santa Clara, CA) SNL
DOE Contract Number:  
AC04-94AL85000
Resource Type:
Patent
Country of Publication:
United States
Language:
English
Subject:
extreme-uv; lithography; condenser; ringfield; camera; projection; series; segments; parent; aspheric; mirror; foci; quasi-point; source; radiation; radius; beams; translated; rotated; sets; mirrors; pass; entrance; pupil; fall; coincident; image; set; correcting; common; emanates; concave; positioned; shape; beam; segment; chord; angle; 25; 85; degrees; 60; extreme-uv lithography; projection lithography; entrance pupil; concave mirror; beam segment; lithography condenser; beams pass; parent aspheric; ringfield camera; aspheric mirror; si-point source; beams translated; correcting mirror; /430/359/378/

Citation Formats

Sweatt, William C., Sweeney, Donald W., Shafer, David, and McGuire, James. Extreme-UV lithography condenser. United States: N. p., 2001. Web.
Sweatt, William C., Sweeney, Donald W., Shafer, David, & McGuire, James. Extreme-UV lithography condenser. United States.
Sweatt, William C., Sweeney, Donald W., Shafer, David, and McGuire, James. Mon . "Extreme-UV lithography condenser". United States. https://www.osti.gov/servlets/purl/873643.
@article{osti_873643,
title = {Extreme-UV lithography condenser},
author = {Sweatt, William C. and Sweeney, Donald W. and Shafer, David and McGuire, James},
abstractNote = {Condenser system for use with a ringfield camera in projection lithography where the condenser includes a series of segments of a parent aspheric mirror having one foci at a quasi-point source of radiation and the other foci at the radius of a ringfield have all but one or all of their beams translated and rotated by sets of mirrors such that all of the beams pass through the real entrance pupil of a ringfield camera about one of the beams and fall onto the ringfield radius as a coincident image as an arc of the ringfield. The condenser has a set of correcting mirrors with one of the correcting mirrors of each set, or a mirror that is common to said sets of mirrors, from which the radiation emanates, is a concave mirror that is positioned to shape a beam segment having a chord angle of about 25 to 85 degrees into a second beam segment having a chord angle of about 0 to 60 degrees.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {2001},
month = {1}
}

Patent:

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