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Title: Phase-shifting point diffraction interferometer grating designs

Abstract

In a phase-shifting point diffraction interferometer, by sending the zeroth-order diffraction to the reference pinhole of the mask and the first-order diffraction to the test beam window of the mask, the test and reference beam intensities can be balanced and the fringe contrast improved. Additionally, using a duty cycle of the diffraction grating other than 50%, the fringe contrast can also be improved.

Inventors:
 [1];  [2];  [3]
  1. Oakland, CA
  2. Berkeley, CA
  3. San Carlos, CA
Issue Date:
Research Org.:
Lawrence Berkeley National Lab. (LBNL), Berkeley, CA (United States)
OSTI Identifier:
873581
Patent Number(s):
6195169
Assignee:
Regents of University of California (Oakland, CA)
Patent Classifications (CPCs):
G - PHYSICS G02 - OPTICS G02B - OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
G - PHYSICS G01 - MEASURING G01J - MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRA-RED, VISIBLE OR ULTRA-VIOLET LIGHT
DOE Contract Number:  
AC03-76SF00098
Resource Type:
Patent
Country of Publication:
United States
Language:
English
Subject:
phase-shifting; diffraction; interferometer; grating; designs; sending; zeroth-order; reference; pinhole; mask; first-order; beam; window; intensities; balanced; fringe; contrast; improved; additionally; duty; cycle; 50; diffraction interferometer; reference beam; diffraction grating; duty cycle; reference pinhole; beam window; fringe contrast; zeroth-order diffraction; grating designs; first-order diffraction; /356/

Citation Formats

Naulleau, Patrick, Goldberg, Kenneth Alan, and Tejnil, Edita. Phase-shifting point diffraction interferometer grating designs. United States: N. p., 2001. Web.
Naulleau, Patrick, Goldberg, Kenneth Alan, & Tejnil, Edita. Phase-shifting point diffraction interferometer grating designs. United States.
Naulleau, Patrick, Goldberg, Kenneth Alan, and Tejnil, Edita. Mon . "Phase-shifting point diffraction interferometer grating designs". United States. https://www.osti.gov/servlets/purl/873581.
@article{osti_873581,
title = {Phase-shifting point diffraction interferometer grating designs},
author = {Naulleau, Patrick and Goldberg, Kenneth Alan and Tejnil, Edita},
abstractNote = {In a phase-shifting point diffraction interferometer, by sending the zeroth-order diffraction to the reference pinhole of the mask and the first-order diffraction to the test beam window of the mask, the test and reference beam intensities can be balanced and the fringe contrast improved. Additionally, using a duty cycle of the diffraction grating other than 50%, the fringe contrast can also be improved.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {2001},
month = {1}
}

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Works referenced in this record:

Electron beam lithography digital pattern generator and electronics for generalized curvilinear structures
journal, November 1995


Electron beam lithography digital pattern generator and electronics for generalized curvilinear structures
journal, November 1995


Phase-shifting point diffraction interferometer
journal, January 1996


Phase-shifting point diffraction interferometer
journal, January 1996


Effect of intensity error correlation on the computed phase of phase-shifting interferometry
journal, January 1990


Effect of intensity error correlation on the computed phase of phase-shifting interferometry
journal, January 1990


Characterization of the accuracy of EUV phase-shifting point diffraction interferometry
conference, June 1998

  • Naulleau, Patrick P.; Goldberg, Kenneth A.; Lee, Sang Hun
  • 23rd Annual International Symposium on Microlithography, SPIE Proceedings
  • https://doi.org/10.1117/12.309563

Characterization of the accuracy of EUV phase-shifting point diffraction interferometry
conference, June 1998

  • Naulleau, Patrick P.; Goldberg, Kenneth A.; Lee, Sang Hun
  • 23rd Annual International Symposium on Microlithography, SPIE Proceedings
  • https://doi.org/10.1117/12.309563