Condenser for ring-field deep-ultraviolet and extreme-ultraviolet lithography
Abstract
A condenser for use with a ring-field deep ultraviolet or extreme ultraviolet lithography system. A condenser includes a ripple-plate mirror which is illuminated by a collimated beam at grazing incidence. The ripple plate comprises a plate mirror into which is formed a series of channels along an axis of the mirror to produce a series of concave surfaces in an undulating pattern. Light incident along the channels of the mirror is reflected onto a series of cones. The distribution of slopes on the ripple plate leads to a distribution of angles of reflection of the incident beam. This distribution has the form of an arc, with the extremes of the arc given by the greatest slope in the ripple plate. An imaging mirror focuses this distribution to a ring-field arc at the mask plane.
- Inventors:
-
- Livermore, CA
- North Fitzroy, AU
- Issue Date:
- Research Org.:
- Lawrence Livermore National Laboratory (LLNL), Livermore, CA (United States)
- OSTI Identifier:
- 873545
- Patent Number(s):
- 6186632
- Assignee:
- Regents of University of California (Oakland, CA)
- Patent Classifications (CPCs):
-
G - PHYSICS G03 - PHOTOGRAPHY G03F - PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES
- DOE Contract Number:
- W-7405-ENG-48
- Resource Type:
- Patent
- Country of Publication:
- United States
- Language:
- English
- Subject:
- condenser; ring-field; deep-ultraviolet; extreme-ultraviolet; lithography; deep; ultraviolet; extreme; ripple-plate; mirror; illuminated; collimated; beam; grazing; incidence; ripple; plate; comprises; formed; series; channels; axis; produce; concave; surfaces; undulating; pattern; light; incident; reflected; cones; distribution; slopes; leads; angles; reflection; form; extremes; slope; imaging; focuses; mask; plane; light incident; ultraviolet lithography; extreme ultraviolet; incident beam; collimated beam; concave surface; ring-field deep; /359/355/
Citation Formats
Chapman, Henry N, and Nugent, Keith A. Condenser for ring-field deep-ultraviolet and extreme-ultraviolet lithography. United States: N. p., 2001.
Web.
Chapman, Henry N, & Nugent, Keith A. Condenser for ring-field deep-ultraviolet and extreme-ultraviolet lithography. United States.
Chapman, Henry N, and Nugent, Keith A. Mon .
"Condenser for ring-field deep-ultraviolet and extreme-ultraviolet lithography". United States. https://www.osti.gov/servlets/purl/873545.
@article{osti_873545,
title = {Condenser for ring-field deep-ultraviolet and extreme-ultraviolet lithography},
author = {Chapman, Henry N and Nugent, Keith A},
abstractNote = {A condenser for use with a ring-field deep ultraviolet or extreme ultraviolet lithography system. A condenser includes a ripple-plate mirror which is illuminated by a collimated beam at grazing incidence. The ripple plate comprises a plate mirror into which is formed a series of channels along an axis of the mirror to produce a series of concave surfaces in an undulating pattern. Light incident along the channels of the mirror is reflected onto a series of cones. The distribution of slopes on the ripple plate leads to a distribution of angles of reflection of the incident beam. This distribution has the form of an arc, with the extremes of the arc given by the greatest slope in the ripple plate. An imaging mirror focuses this distribution to a ring-field arc at the mask plane.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {2001},
month = {1}
}
Works referenced in this record:
Illumination system for extreme ultraviolet lithography
journal, November 1995
- Haga, Tsuneyuki
- Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, Vol. 13, Issue 6