Inspection of lithographic mask blanks for defects
Abstract
A visible light method for detecting sub-100 nm size defects on mask blanks used for lithography. By using optical heterodyne techniques, detection of the scattered light can be significantly enhanced as compared to standard intensity detection methods. The invention is useful in the inspection of super-polished surfaces for isolated surface defects or particulate contamination and in the inspection of lithographic mask or reticle blanks for surface defects or bulk defects or for surface particulate contamination.
- Inventors:
-
- Santa Cruz, CA
- Issue Date:
- Research Org.:
- Lawrence Livermore National Laboratory (LLNL), Livermore, CA (United States)
- OSTI Identifier:
- 873511
- Patent Number(s):
- 6177993
- Assignee:
- Regents of University of California (Oakland, CA)
- Patent Classifications (CPCs):
-
G - PHYSICS G01 - MEASURING G01N - INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- DOE Contract Number:
- W-7405-ENG-48
- Resource Type:
- Patent
- Country of Publication:
- United States
- Language:
- English
- Subject:
- inspection; lithographic; mask; blanks; defects; visible; light; method; detecting; sub-100; nm; size; lithography; optical; heterodyne; techniques; detection; scattered; significantly; enhanced; compared; standard; intensity; methods; useful; super-polished; surfaces; isolated; surface; particulate; contamination; reticle; bulk; surface defects; significantly enhanced; detection methods; detection method; scattered light; visible light; particulate contamination; optical heterodyne; heterodyne techniques; standard intensity; heterodyne technique; lithographic mask; mask blanks; /356/
Citation Formats
Sommargren, Gary E. Inspection of lithographic mask blanks for defects. United States: N. p., 2001.
Web.
Sommargren, Gary E. Inspection of lithographic mask blanks for defects. United States.
Sommargren, Gary E. Mon .
"Inspection of lithographic mask blanks for defects". United States. https://www.osti.gov/servlets/purl/873511.
@article{osti_873511,
title = {Inspection of lithographic mask blanks for defects},
author = {Sommargren, Gary E},
abstractNote = {A visible light method for detecting sub-100 nm size defects on mask blanks used for lithography. By using optical heterodyne techniques, detection of the scattered light can be significantly enhanced as compared to standard intensity detection methods. The invention is useful in the inspection of super-polished surfaces for isolated surface defects or particulate contamination and in the inspection of lithographic mask or reticle blanks for surface defects or bulk defects or for surface particulate contamination.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {2001},
month = {1}
}
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