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Title: Inspection of lithographic mask blanks for defects

Abstract

A visible light method for detecting sub-100 nm size defects on mask blanks used for lithography. By using optical heterodyne techniques, detection of the scattered light can be significantly enhanced as compared to standard intensity detection methods. The invention is useful in the inspection of super-polished surfaces for isolated surface defects or particulate contamination and in the inspection of lithographic mask or reticle blanks for surface defects or bulk defects or for surface particulate contamination.

Inventors:
 [1]
  1. Santa Cruz, CA
Issue Date:
Research Org.:
Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States)
OSTI Identifier:
873511
Patent Number(s):
6177993
Assignee:
Regents of University of California (Oakland, CA)
DOE Contract Number:  
W-7405-ENG-48
Resource Type:
Patent
Country of Publication:
United States
Language:
English
Subject:
inspection; lithographic; mask; blanks; defects; visible; light; method; detecting; sub-100; nm; size; lithography; optical; heterodyne; techniques; detection; scattered; significantly; enhanced; compared; standard; intensity; methods; useful; super-polished; surfaces; isolated; surface; particulate; contamination; reticle; bulk; surface defects; significantly enhanced; detection methods; detection method; scattered light; visible light; particulate contamination; optical heterodyne; heterodyne techniques; standard intensity; heterodyne technique; lithographic mask; mask blanks; /356/

Citation Formats

Sommargren, Gary E. Inspection of lithographic mask blanks for defects. United States: N. p., 2001. Web.
Sommargren, Gary E. Inspection of lithographic mask blanks for defects. United States.
Sommargren, Gary E. Mon . "Inspection of lithographic mask blanks for defects". United States. https://www.osti.gov/servlets/purl/873511.
@article{osti_873511,
title = {Inspection of lithographic mask blanks for defects},
author = {Sommargren, Gary E},
abstractNote = {A visible light method for detecting sub-100 nm size defects on mask blanks used for lithography. By using optical heterodyne techniques, detection of the scattered light can be significantly enhanced as compared to standard intensity detection methods. The invention is useful in the inspection of super-polished surfaces for isolated surface defects or particulate contamination and in the inspection of lithographic mask or reticle blanks for surface defects or bulk defects or for surface particulate contamination.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {2001},
month = {1}
}

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