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Title: Phase-shifting point diffraction interferometer focus-aid enhanced mask

Abstract

A phase-shifting point diffraction interferometer system (PS/PDI) employing a PS/PDI mask that includes a PDI focus aid is provided. The PDI focus aid mask includes a large or secondary reference pinhole that is slightly displaced from the true or primary reference pinhole. The secondary pinhole provides a larger capture tolerance for interferometrically performing fine focus. With the focus-aid enhanced mask, conventional methods such as the knife-edge test can be used to perform an initial (or rough) focus and the secondary (large) pinhole is used to perform interferometric fine focus. Once the system is well focused, high accuracy interferometry can be performed using the primary (small) pinhole.

Inventors:
 [1]
  1. 5239 Miles Ave., Apt. A, Oakland, CA 94618
Issue Date:
Research Org.:
Lawrence Berkeley National Lab. (LBNL), Berkeley, CA (United States)
OSTI Identifier:
873397
Patent Number(s):
6151115
Assignee:
Naulleau, Patrick (5239 Miles Ave., Apt. A, Oakland, CA 94618)
Patent Classifications (CPCs):
G - PHYSICS G01 - MEASURING G01B - MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS
G - PHYSICS G03 - PHOTOGRAPHY G03F - PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES
DOE Contract Number:  
AC03-76SF00098
Resource Type:
Patent
Country of Publication:
United States
Language:
English
Subject:
phase-shifting; diffraction; interferometer; focus-aid; enhanced; mask; pdi; employing; focus; provided; secondary; reference; pinhole; slightly; displaced; true; primary; provides; larger; capture; tolerance; interferometrically; performing; fine; conventional; methods; knife-edge; perform; initial; interferometric; focused; accuracy; interferometry; performed; diffraction interferometer; conventional methods; reference pinhole; pdi mask; pdi focus; /356/

Citation Formats

Naulleau, Patrick. Phase-shifting point diffraction interferometer focus-aid enhanced mask. United States: N. p., 2000. Web.
Naulleau, Patrick. Phase-shifting point diffraction interferometer focus-aid enhanced mask. United States.
Naulleau, Patrick. Sat . "Phase-shifting point diffraction interferometer focus-aid enhanced mask". United States. https://www.osti.gov/servlets/purl/873397.
@article{osti_873397,
title = {Phase-shifting point diffraction interferometer focus-aid enhanced mask},
author = {Naulleau, Patrick},
abstractNote = {A phase-shifting point diffraction interferometer system (PS/PDI) employing a PS/PDI mask that includes a PDI focus aid is provided. The PDI focus aid mask includes a large or secondary reference pinhole that is slightly displaced from the true or primary reference pinhole. The secondary pinhole provides a larger capture tolerance for interferometrically performing fine focus. With the focus-aid enhanced mask, conventional methods such as the knife-edge test can be used to perform an initial (or rough) focus and the secondary (large) pinhole is used to perform interferometric fine focus. Once the system is well focused, high accuracy interferometry can be performed using the primary (small) pinhole.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {2000},
month = {1}
}

Works referenced in this record:

Electron beam lithography digital pattern generator and electronics for generalized curvilinear structures
journal, November 1995


Electron beam lithography digital pattern generator and electronics for generalized curvilinear structures
journal, November 1995


Phase-shifting point diffraction interferometer
journal, January 1996


Phase-shifting point diffraction interferometer
journal, January 1996


Effect of intensity error correlation on the computed phase of phase-shifting interferometry
journal, January 1990


Effect of intensity error correlation on the computed phase of phase-shifting interferometry
journal, January 1990


Characterization of the accuracy of EUV phase-shifting point diffraction interferometry
conference, June 1998

  • Naulleau, Patrick P.; Goldberg, Kenneth A.; Lee, Sang Hun
  • 23rd Annual International Symposium on Microlithography, SPIE Proceedings
  • https://doi.org/10.1117/12.309563

Characterization of the accuracy of EUV phase-shifting point diffraction interferometry
conference, June 1998

  • Naulleau, Patrick P.; Goldberg, Kenneth A.; Lee, Sang Hun
  • 23rd Annual International Symposium on Microlithography, SPIE Proceedings
  • https://doi.org/10.1117/12.309563