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Title: Phase-shifting point diffraction interferometer focus-aid enhanced mask

Abstract

A phase-shifting point diffraction interferometer system (PS/PDI) employing a PS/PDI mask that includes a PDI focus aid is provided. The PDI focus aid mask includes a large or secondary reference pinhole that is slightly displaced from the true or primary reference pinhole. The secondary pinhole provides a larger capture tolerance for interferometrically performing fine focus. With the focus-aid enhanced mask, conventional methods such as the knife-edge test can be used to perform an initial (or rough) focus and the secondary (large) pinhole is used to perform interferometric fine focus. Once the system is well focused, high accuracy interferometry can be performed using the primary (small) pinhole.

Inventors:
 [1]
  1. (5239 Miles Ave., Apt. A, Oakland, CA 94618)
Issue Date:
Research Org.:
Lawrence Berkeley National Laboratory (LBNL), Berkeley, CA
OSTI Identifier:
873397
Patent Number(s):
6151115
Assignee:
Naulleau, Patrick (5239 Miles Ave., Apt. A, Oakland, CA 94618) LBNL
DOE Contract Number:  
AC03-76SF00098
Resource Type:
Patent
Country of Publication:
United States
Language:
English
Subject:
phase-shifting; diffraction; interferometer; focus-aid; enhanced; mask; pdi; employing; focus; provided; secondary; reference; pinhole; slightly; displaced; true; primary; provides; larger; capture; tolerance; interferometrically; performing; fine; conventional; methods; knife-edge; perform; initial; interferometric; focused; accuracy; interferometry; performed; diffraction interferometer; conventional methods; reference pinhole; pdi mask; pdi focus; /356/

Citation Formats

Naulleau, Patrick. Phase-shifting point diffraction interferometer focus-aid enhanced mask. United States: N. p., 2000. Web.
Naulleau, Patrick. Phase-shifting point diffraction interferometer focus-aid enhanced mask. United States.
Naulleau, Patrick. Sat . "Phase-shifting point diffraction interferometer focus-aid enhanced mask". United States. https://www.osti.gov/servlets/purl/873397.
@article{osti_873397,
title = {Phase-shifting point diffraction interferometer focus-aid enhanced mask},
author = {Naulleau, Patrick},
abstractNote = {A phase-shifting point diffraction interferometer system (PS/PDI) employing a PS/PDI mask that includes a PDI focus aid is provided. The PDI focus aid mask includes a large or secondary reference pinhole that is slightly displaced from the true or primary reference pinhole. The secondary pinhole provides a larger capture tolerance for interferometrically performing fine focus. With the focus-aid enhanced mask, conventional methods such as the knife-edge test can be used to perform an initial (or rough) focus and the secondary (large) pinhole is used to perform interferometric fine focus. Once the system is well focused, high accuracy interferometry can be performed using the primary (small) pinhole.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {2000},
month = {1}
}

Patent:

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