Projection optics box
Abstract
A projection optics box or assembly for use in an optical assembly, such as in an extreme ultraviolet lithography (EUVL) system using 10-14 nm soft x-ray photons. The projection optics box utilizes a plurality of highly reflective optics or mirrors, each mounted on a precision actuator, and which reflects an optical image, such as from a mask, in the EUVL system onto a point of use, such as a target or silicon wafer, the mask, for example, receiving an optical signal from a source assembly, such as a developed from laser system, via a series of highly reflective mirrors of the EUVL system. The plurality of highly reflective optics or mirrors are mounted in a housing assembly comprised of a series of bulkheads having wall members secured together to form a unit construction of maximum rigidity. Due to the precision actuators, the mirrors must be positioned precisely and remotely in tip, tilt, and piston (three degrees of freedom), while also providing exact constraint.
- Inventors:
-
- Livermore, CA
- Tracy, CA
- San Ramon, CA
- Issue Date:
- Research Org.:
- Lawrence Livermore National Laboratory (LLNL), Livermore, CA (United States)
- OSTI Identifier:
- 873381
- Patent Number(s):
- 6147818
- Assignee:
- Regents of University of California (Oakland, CA)
- Patent Classifications (CPCs):
-
G - PHYSICS G02 - OPTICS G02B - OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
G - PHYSICS G03 - PHOTOGRAPHY G03F - PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES
- DOE Contract Number:
- W-7405-ENG-48
- Resource Type:
- Patent
- Country of Publication:
- United States
- Language:
- English
- Subject:
- projection; optics; box; assembly; optical; extreme; ultraviolet; lithography; euvl; 10-14; nm; soft; x-ray; photons; utilizes; plurality; highly; reflective; mirrors; mounted; precision; actuator; reflects; image; mask; target; silicon; wafer; example; receiving; signal; source; developed; laser; via; series; housing; comprised; bulkheads; wall; secured; form; unit; construction; maximum; rigidity; due; actuators; positioned; precisely; remotely; tip; tilt; piston; degrees; freedom; providing; exact; constraint; source assembly; reflective mirrors; housing assembly; highly reflective; ultraviolet lithography; extreme ultraviolet; soft x-ray; optical signal; silicon wafer; optical assembly; positioned precisely; optics box; optical image; projection optics; reflective mirror; unit construction; x-ray photons; exact constraint; ray photons; x-ray photon; assembly comprised; /359/
Citation Formats
Hale, Layton C, Malsbury, Terry, Hudyma, Russell M, and Parker, John M. Projection optics box. United States: N. p., 2000.
Web.
Hale, Layton C, Malsbury, Terry, Hudyma, Russell M, & Parker, John M. Projection optics box. United States.
Hale, Layton C, Malsbury, Terry, Hudyma, Russell M, and Parker, John M. Sat .
"Projection optics box". United States. https://www.osti.gov/servlets/purl/873381.
@article{osti_873381,
title = {Projection optics box},
author = {Hale, Layton C and Malsbury, Terry and Hudyma, Russell M and Parker, John M},
abstractNote = {A projection optics box or assembly for use in an optical assembly, such as in an extreme ultraviolet lithography (EUVL) system using 10-14 nm soft x-ray photons. The projection optics box utilizes a plurality of highly reflective optics or mirrors, each mounted on a precision actuator, and which reflects an optical image, such as from a mask, in the EUVL system onto a point of use, such as a target or silicon wafer, the mask, for example, receiving an optical signal from a source assembly, such as a developed from laser system, via a series of highly reflective mirrors of the EUVL system. The plurality of highly reflective optics or mirrors are mounted in a housing assembly comprised of a series of bulkheads having wall members secured together to form a unit construction of maximum rigidity. Due to the precision actuators, the mirrors must be positioned precisely and remotely in tip, tilt, and piston (three degrees of freedom), while also providing exact constraint.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {2000},
month = {1}
}