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Title: Constricted glow discharge plasma source

Abstract

A constricted glow discharge chamber and method are disclosed. The polarity and geometry of the constricted glow discharge plasma source is set so that the contamination and energy of the ions discharged from the source are minimized. The several sources can be mounted in parallel and in series to provide a sustained ultra low source of ions in a plasma with contamination below practical detection limits. The source is suitable for applying films of nitrides such as gallium nitride and oxides such as tungsten oxide and for enriching other substances in material surfaces such as oxygen and water vapor, which are difficult process as plasma in any known devices and methods. The source can also be used to assist the deposition of films such as metal films by providing low-energy ions such as argon ions.

Inventors:
 [1];  [1];  [2];  [3];  [4]
  1. (Albany, CA)
  2. (San Leandro, CA)
  3. (Berkeley, CA)
  4. (Winnetka, IL)
Issue Date:
Research Org.:
Lawrence Berkeley National Laboratory (LBNL), Berkeley, CA
OSTI Identifier:
873337
Patent Number(s):
6137231
Assignee:
Regents of University of California (Oakland, CA) LBNL
DOE Contract Number:  
AC03-76SF00098
Resource Type:
Patent
Country of Publication:
United States
Language:
English
Subject:
constricted; glow; discharge; plasma; source; chamber; method; disclosed; polarity; geometry; set; contamination; energy; discharged; minimized; sources; mounted; parallel; series; provide; sustained; ultra; below; practical; detection; limits; suitable; applying; films; nitrides; gallium; nitride; oxides; tungsten; oxide; enriching; substances; material; surfaces; oxygen; water; vapor; difficult; process; devices; methods; assist; deposition; metal; providing; low-energy; argon; metal films; metal film; constricted glow; gallium nitride; plasma source; water vapor; glow discharge; material surface; discharge plasma; tungsten oxide; detection limits; discharge chamber; material surfaces; detection limit; /315/118/313/

Citation Formats

Anders, Andre, Anders, Simone, Dickinson, Michael, Rubin, Michael, and Newman, Nathan. Constricted glow discharge plasma source. United States: N. p., 2000. Web.
Anders, Andre, Anders, Simone, Dickinson, Michael, Rubin, Michael, & Newman, Nathan. Constricted glow discharge plasma source. United States.
Anders, Andre, Anders, Simone, Dickinson, Michael, Rubin, Michael, and Newman, Nathan. Sat . "Constricted glow discharge plasma source". United States. https://www.osti.gov/servlets/purl/873337.
@article{osti_873337,
title = {Constricted glow discharge plasma source},
author = {Anders, Andre and Anders, Simone and Dickinson, Michael and Rubin, Michael and Newman, Nathan},
abstractNote = {A constricted glow discharge chamber and method are disclosed. The polarity and geometry of the constricted glow discharge plasma source is set so that the contamination and energy of the ions discharged from the source are minimized. The several sources can be mounted in parallel and in series to provide a sustained ultra low source of ions in a plasma with contamination below practical detection limits. The source is suitable for applying films of nitrides such as gallium nitride and oxides such as tungsten oxide and for enriching other substances in material surfaces such as oxygen and water vapor, which are difficult process as plasma in any known devices and methods. The source can also be used to assist the deposition of films such as metal films by providing low-energy ions such as argon ions.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {2000},
month = {1}
}

Patent:

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