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Title: Focused ion beam source method and apparatus

Abstract

A focused ion beam having a cross section of submicron diameter, a high ion current, and a narrow energy range is generated from a target comprised of particle source material by laser ablation. The method involves directing a laser beam having a cross section of critical diameter onto the target, producing a cloud of laser ablated particles having unique characteristics, and extracting and focusing a charged particle beam from the laser ablated cloud. The method is especially suited for producing focused ion beams for semiconductor device analysis and modification.

Inventors:
 [1];  [2];  [3]
+ Show Inventor Affiliations
  1. Naperville, IL
  2. Gaithersburg, MD
  3. Sunnyvale, CA
Issue Date:
Research Org.:
Argonne National Laboratory (ANL), Argonne, IL (United States)
OSTI Identifier:
873336
Patent Number(s):
6137110
Assignee:
United States of America as represented by United States (Washington, DC)
Patent Classifications (CPCs):
H - ELECTRICITY H01 - BASIC ELECTRIC ELEMENTS H01J - ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
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DOE Contract Number:  
W-31109-ENG-38
Resource Type:
Patent
Country of Publication:
United States
Language:
English
Subject:
focused; beam; source; method; apparatus; section; submicron; diameter; current; narrow; energy; range; generated; target; comprised; particle; material; laser; ablation; involves; directing; critical; producing; cloud; ablated; particles; unique; characteristics; extracting; focusing; charged; especially; suited; beams; semiconductor; device; analysis; modification; involves directing; especially suited; source material; particle beam; method involves; laser beam; charged particle; semiconductor device; beam source; laser ablation; energy range; unique characteristics; laser ablated; method involve; micron diameter; narrow energy; unique characteristic; /250/

Citation Formats

Pellin, Michael J, Lykke, Keith R, and Lill, Thorsten B. Focused ion beam source method and apparatus. United States: N. p., 2000. Web.
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Pellin, Michael J, Lykke, Keith R, & Lill, Thorsten B. Focused ion beam source method and apparatus. United States.
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Pellin, Michael J, Lykke, Keith R, and Lill, Thorsten B. Sat . "Focused ion beam source method and apparatus". United States. https://www.osti.gov/servlets/purl/873336.
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@article{osti_873336,
title = {Focused ion beam source method and apparatus},
author = {Pellin, Michael J and Lykke, Keith R and Lill, Thorsten B},
abstractNote = {A focused ion beam having a cross section of submicron diameter, a high ion current, and a narrow energy range is generated from a target comprised of particle source material by laser ablation. The method involves directing a laser beam having a cross section of critical diameter onto the target, producing a cloud of laser ablated particles having unique characteristics, and extracting and focusing a charged particle beam from the laser ablated cloud. The method is especially suited for producing focused ion beams for semiconductor device analysis and modification.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {2000},
month = {1}
}
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