In Situ alignment system for phase-shifting point-diffraction interferometry
Abstract
A device and method to facilitate the gross alignment of patterned object- and image-plane masks in optical systems such as the phase-shifting point diffraction interferometer are provided. When an array of similar pinholes or discreet mask fields is used, confusion can occur over the alignment of the focused beams within the field. Adding to the mask pattern a circumscribed or inscribed set of symbols that are identifiable in situ facilitates the unambiguous gross alignment of the object- and/or image-plane masks. Alternatively, a system of markings can be encoded directly into the window shape to accomplish this same task.
- Inventors:
-
- 1195 Keeler Ave., Berkeley, CA 94708
- 5239 Miles Ave., Apt. A, Oakland, CA 94618
- Issue Date:
- Research Org.:
- Lawrence Berkeley National Laboratory (LBNL), Berkeley, CA (United States)
- OSTI Identifier:
- 873241
- Patent Number(s):
- 6118535
- Assignee:
- Goldberg, Kenneth Alan (1195 Keeler Ave., Berkeley, CA 94708);Naulleau, Patrick P. (5239 Miles Ave., Apt. A, Oakland, CA 94618)
- Patent Classifications (CPCs):
-
G - PHYSICS G03 - PHOTOGRAPHY G03F - PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES
- DOE Contract Number:
- AC03-76SF00098
- Resource Type:
- Patent
- Country of Publication:
- United States
- Language:
- English
- Subject:
- situ; alignment; phase-shifting; point-diffraction; interferometry; device; method; facilitate; gross; patterned; object-; image-plane; masks; optical; systems; diffraction; interferometer; provided; array; similar; pinholes; discreet; mask; fields; confusion; occur; focused; beams; field; adding; pattern; circumscribed; inscribed; set; symbols; identifiable; facilitates; unambiguous; alternatively; markings; encoded; directly; window; shape; accomplish; task; diffraction interferometer; optical systems; focused beam; mask pattern; focused beams; /356/
Citation Formats
Goldberg, Kenneth Alan, and Naulleau, Patrick P. In Situ alignment system for phase-shifting point-diffraction interferometry. United States: N. p., 2000.
Web.
Goldberg, Kenneth Alan, & Naulleau, Patrick P. In Situ alignment system for phase-shifting point-diffraction interferometry. United States.
Goldberg, Kenneth Alan, and Naulleau, Patrick P. Sat .
"In Situ alignment system for phase-shifting point-diffraction interferometry". United States. https://www.osti.gov/servlets/purl/873241.
@article{osti_873241,
title = {In Situ alignment system for phase-shifting point-diffraction interferometry},
author = {Goldberg, Kenneth Alan and Naulleau, Patrick P},
abstractNote = {A device and method to facilitate the gross alignment of patterned object- and image-plane masks in optical systems such as the phase-shifting point diffraction interferometer are provided. When an array of similar pinholes or discreet mask fields is used, confusion can occur over the alignment of the focused beams within the field. Adding to the mask pattern a circumscribed or inscribed set of symbols that are identifiable in situ facilitates the unambiguous gross alignment of the object- and/or image-plane masks. Alternatively, a system of markings can be encoded directly into the window shape to accomplish this same task.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {Sat Jan 01 00:00:00 EST 2000},
month = {Sat Jan 01 00:00:00 EST 2000}
}
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