Erosion resistant nozzles for laser plasma extreme ultraviolet (EUV) sources
Abstract
A gas nozzle having an increased resistance to erosion from energetic plasma particles generated by laser plasma sources. By reducing the area of the plasma-facing portion of the nozzle below a critical dimension and fabricating the nozzle from a material that has a high EUV transmission as well as a low sputtering coefficient such as Be, C, or Si, it has been shown that a significant reduction in reflectance loss of nearby optical components can be achieved even after exposing the nozzle to at least 10.sup.7 Xe plasma pulses.
- Inventors:
-
- Livermore, CA
- (Tracy, CA)
- Issue Date:
- Research Org.:
- Sandia National Laboratories (SNL), Albuquerque, NM, and Livermore, CA (United States)
- OSTI Identifier:
- 872796
- Patent Number(s):
- 6011267
- Application Number:
- 09/032,224
- Assignee:
- EUV LLC (Santa Clara, CA)
- Patent Classifications (CPCs):
-
H - ELECTRICITY H01 - BASIC ELECTRIC ELEMENTS H01J - ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
H - ELECTRICITY H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR H05G - X-RAY TECHNIQUE
- DOE Contract Number:
- AC04 -94DP85000
- Resource Type:
- Patent
- Country of Publication:
- United States
- Language:
- English
- Subject:
- erosion; resistant; nozzles; laser; plasma; extreme; ultraviolet; euv; sources; gas; nozzle; increased; resistance; energetic; particles; generated; reducing; plasma-facing; portion; below; critical; dimension; fabricating; material; transmission; sputtering; coefficient; shown; significant; reduction; reflectance; loss; nearby; optical; components; achieved; exposing; 10; xe; pulses; plasma sources; laser plasma; significant reduction; optical components; plasma source; extreme ultraviolet; critical dimension; particles generated; erosion resistant; optical component; increased resistance; energetic plasma; plasma extreme; /250/378/
Citation Formats
Kubiak, Glenn D, and Bernardez, II, Luis J. Erosion resistant nozzles for laser plasma extreme ultraviolet (EUV) sources. United States: N. p., 2000.
Web.
Kubiak, Glenn D, & Bernardez, II, Luis J. Erosion resistant nozzles for laser plasma extreme ultraviolet (EUV) sources. United States.
Kubiak, Glenn D, and Bernardez, II, Luis J. Tue .
"Erosion resistant nozzles for laser plasma extreme ultraviolet (EUV) sources". United States. https://www.osti.gov/servlets/purl/872796.
@article{osti_872796,
title = {Erosion resistant nozzles for laser plasma extreme ultraviolet (EUV) sources},
author = {Kubiak, Glenn D and Bernardez, II, Luis J.},
abstractNote = {A gas nozzle having an increased resistance to erosion from energetic plasma particles generated by laser plasma sources. By reducing the area of the plasma-facing portion of the nozzle below a critical dimension and fabricating the nozzle from a material that has a high EUV transmission as well as a low sputtering coefficient such as Be, C, or Si, it has been shown that a significant reduction in reflectance loss of nearby optical components can be achieved even after exposing the nozzle to at least 10.sup.7 Xe plasma pulses.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {2000},
month = {1}
}
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