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Title: Maskless deposition technique for the physical vapor deposition of thin film and multilayer coatings with subnanometer precision and accuracy

Abstract

The invention is a method for the production of axially symmetric, graded and ungraded thickness thin film and multilayer coatings that avoids the use of apertures or masks to tailor the deposition profile. A motional averaging scheme permits the deposition of uniform thickness coatings independent of the substrate radius. Coating uniformity results from an exact cancellation of substrate radius dependent terms, which occurs when the substrate moves at constant velocity. If the substrate is allowed to accelerate over the source, arbitrary coating profiles can be generated through appropriate selection and control of the substrate center of mass equation of motion. The radial symmetry of the coating profile is an artifact produced by orbiting the substrate about its center of mass; other distributions are obtained by selecting another rotation axis. Consequently there is a direct mapping between the coating thickness and substrate equation of motion which can be used to tailor the coating profile without the use of masks and apertures.

Inventors:
 [1];  [2]
  1. (Pleasanton, CA)
  2. (Livermore, CA)
Issue Date:
Research Org.:
Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States)
OSTI Identifier:
872791
Patent Number(s):
6010600
Assignee:
Regents of University of California (Oakland, CA) LLNL
DOE Contract Number:  
W-7405-ENG-48
Resource Type:
Patent
Country of Publication:
United States
Language:
English
Subject:
maskless; deposition; technique; physical; vapor; film; multilayer; coatings; subnanometer; precision; accuracy; method; production; axially; symmetric; graded; ungraded; thickness; avoids; apertures; masks; tailor; profile; motional; averaging; scheme; permits; uniform; independent; substrate; radius; coating; uniformity; results; exact; cancellation; dependent; terms; occurs; moves; constant; velocity; allowed; accelerate; source; arbitrary; profiles; generated; appropriate; selection; control; center; mass; equation; motion; radial; symmetry; artifact; produced; orbiting; distributions; obtained; selecting; rotation; axis; consequently; direct; mapping; multilayer coatings; multilayer coating; appropriate selection; uniform thickness; vapor deposition; physical vapor; rotation axis; axially symmetric; constant velocity; deposition technique; coating thickness; radius dependent; rate equation; /204/427/

Citation Formats

Vernon, Stephen P., and Ceglio, Natale M. Maskless deposition technique for the physical vapor deposition of thin film and multilayer coatings with subnanometer precision and accuracy. United States: N. p., 2000. Web.
Vernon, Stephen P., & Ceglio, Natale M. Maskless deposition technique for the physical vapor deposition of thin film and multilayer coatings with subnanometer precision and accuracy. United States.
Vernon, Stephen P., and Ceglio, Natale M. Sat . "Maskless deposition technique for the physical vapor deposition of thin film and multilayer coatings with subnanometer precision and accuracy". United States. https://www.osti.gov/servlets/purl/872791.
@article{osti_872791,
title = {Maskless deposition technique for the physical vapor deposition of thin film and multilayer coatings with subnanometer precision and accuracy},
author = {Vernon, Stephen P. and Ceglio, Natale M.},
abstractNote = {The invention is a method for the production of axially symmetric, graded and ungraded thickness thin film and multilayer coatings that avoids the use of apertures or masks to tailor the deposition profile. A motional averaging scheme permits the deposition of uniform thickness coatings independent of the substrate radius. Coating uniformity results from an exact cancellation of substrate radius dependent terms, which occurs when the substrate moves at constant velocity. If the substrate is allowed to accelerate over the source, arbitrary coating profiles can be generated through appropriate selection and control of the substrate center of mass equation of motion. The radial symmetry of the coating profile is an artifact produced by orbiting the substrate about its center of mass; other distributions are obtained by selecting another rotation axis. Consequently there is a direct mapping between the coating thickness and substrate equation of motion which can be used to tailor the coating profile without the use of masks and apertures.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {2000},
month = {1}
}

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