Infrared light sources with semimetal electron injection
Abstract
An infrared light source is disclosed that comprises a layered semiconductor active region having a semimetal region and at least one quantum-well layer. The semimetal region, formed at an interface between a GaAsSb or GalnSb layer and an InAsSb layer, provides electrons and holes to the quantum-well layer to generate infrared light at a predetermined wavelength in the range of 2-6 .mu.m. Embodiments of the invention can be formed as electrically-activated light-emitting diodes (LEDs) or lasers, and as optically-pumped lasers. Since the active region is unipolar, multiple active regions can be stacked to form a broadband or multiple-wavelength infrared light source.
- Inventors:
-
- Albuquerque, NM
- Issue Date:
- Research Org.:
- Sandia National Laboratories (SNL), Albuquerque, NM, and Livermore, CA (United States)
- OSTI Identifier:
- 872719
- Patent Number(s):
- 5995529
- Assignee:
- Sandia Corporation (Albuquerque, NM)
- Patent Classifications (CPCs):
-
B - PERFORMING OPERATIONS B82 - NANOTECHNOLOGY B82Y - SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES
H - ELECTRICITY H01 - BASIC ELECTRIC ELEMENTS H01L - SEMICONDUCTOR DEVICES
- DOE Contract Number:
- AC04-94AL85000
- Resource Type:
- Patent
- Country of Publication:
- United States
- Language:
- English
- Subject:
- infrared; light; sources; semimetal; electron; injection; source; disclosed; comprises; layered; semiconductor; active; region; quantum-well; layer; formed; interface; gaassb; galnsb; inassb; provides; electrons; holes; generate; predetermined; wavelength; range; 2-6; embodiments; electrically-activated; light-emitting; diodes; leds; lasers; optically-pumped; unipolar; multiple; regions; stacked; form; broadband; multiple-wavelength; emitting diodes; emitting diode; light-emitting diode; quantum-well layer; infrared light; predetermined wavelength; active region; light source; light sources; pumped laser; light-emitting diodes; semiconductor active; semimetal region; electron injection; sb layer; layered semiconductor; /372/257/
Citation Formats
Kurtz, Steven R, Biefeld, Robert M, and Allerman, Andrew A. Infrared light sources with semimetal electron injection. United States: N. p., 1999.
Web.
Kurtz, Steven R, Biefeld, Robert M, & Allerman, Andrew A. Infrared light sources with semimetal electron injection. United States.
Kurtz, Steven R, Biefeld, Robert M, and Allerman, Andrew A. Fri .
"Infrared light sources with semimetal electron injection". United States. https://www.osti.gov/servlets/purl/872719.
@article{osti_872719,
title = {Infrared light sources with semimetal electron injection},
author = {Kurtz, Steven R and Biefeld, Robert M and Allerman, Andrew A},
abstractNote = {An infrared light source is disclosed that comprises a layered semiconductor active region having a semimetal region and at least one quantum-well layer. The semimetal region, formed at an interface between a GaAsSb or GalnSb layer and an InAsSb layer, provides electrons and holes to the quantum-well layer to generate infrared light at a predetermined wavelength in the range of 2-6 .mu.m. Embodiments of the invention can be formed as electrically-activated light-emitting diodes (LEDs) or lasers, and as optically-pumped lasers. Since the active region is unipolar, multiple active regions can be stacked to form a broadband or multiple-wavelength infrared light source.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {1999},
month = {1}
}
Works referenced in this record:
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