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Title: Method for correcting imperfections on a surface

Abstract

A process for producing near perfect optical surfaces. A previously polished optical surface is measured to determine its deviations from the desired perfect surface. A multi-aperture mask is designed based on this measurement and fabricated such that deposition through the mask will correct the deviations in the surface to an acceptable level. Various mask geometries can be used: variable individual aperture sizes using a fixed grid for the apertures or fixed aperture sizes using a variable aperture spacing. The imperfections are filled in using a vacuum deposition process with a very thin thickness of material such as silicon monoxide to produce an amorphous surface that bonds well to a glass substrate.

Inventors:
 [1];  [1]
  1. (Albuquerque, NM)
Issue Date:
Research Org.:
SANDIA CORP
OSTI Identifier:
872501
Patent Number(s):
5948468
Application Number:
08/850,665
Assignee:
Sandia Corporation (Albuquerque, NM) SNL
DOE Contract Number:  
AC04-95AL85000
Resource Type:
Patent
Country of Publication:
United States
Language:
English
Subject:
method; correcting; imperfections; surface; process; producing; near; perfect; optical; surfaces; previously; polished; measured; determine; deviations; desired; multi-aperture; mask; designed; based; measurement; fabricated; deposition; correct; acceptable; level; various; geometries; variable; individual; aperture; sizes; fixed; grid; apertures; spacing; filled; vacuum; thickness; material; silicon; monoxide; produce; amorphous; bonds; glass; substrate; silicon monoxide; variable aperture; vacuum deposition; deposition process; glass substrate; optical surfaces; optical surface; near perfect; producing near; acceptable level; dual aperture; designed based; /427/

Citation Formats

Sweatt, William C., and Weed, John W. Method for correcting imperfections on a surface. United States: N. p., 1999. Web.
Sweatt, William C., & Weed, John W. Method for correcting imperfections on a surface. United States.
Sweatt, William C., and Weed, John W. Tue . "Method for correcting imperfections on a surface". United States. https://www.osti.gov/servlets/purl/872501.
@article{osti_872501,
title = {Method for correcting imperfections on a surface},
author = {Sweatt, William C. and Weed, John W.},
abstractNote = {A process for producing near perfect optical surfaces. A previously polished optical surface is measured to determine its deviations from the desired perfect surface. A multi-aperture mask is designed based on this measurement and fabricated such that deposition through the mask will correct the deviations in the surface to an acceptable level. Various mask geometries can be used: variable individual aperture sizes using a fixed grid for the apertures or fixed aperture sizes using a variable aperture spacing. The imperfections are filled in using a vacuum deposition process with a very thin thickness of material such as silicon monoxide to produce an amorphous surface that bonds well to a glass substrate.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {1999},
month = {9}
}

Patent:

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