Heating device for semiconductor wafers
Abstract
An apparatus for heat treating semiconductor wafers is disclosed. The apparatus includes a heating device which contains an assembly of light energy sources for emitting light energy onto a wafer. In particular, the light energy sources are positioned such that many different radial heating zones are created on a wafer being heated. For instance, in one embodiment, the light energy sources form a spiral configuration. In an alternative embodiment, the light energy sources appear to be randomly dispersed with respect to each other so that no discernable pattern is present. In a third alternative embodiment of the present invention, the light energy sources form concentric rings. Tuning light sources are then placed in between the concentric rings of light.
- Inventors:
-
- Berkeley, CA
- Issue Date:
- Research Org.:
- Sandia National Laboratories (SNL), Albuquerque, NM, and Livermore, CA (United States)
- OSTI Identifier:
- 872418
- Patent Number(s):
- 5930456
- Assignee:
- AG Associates (San Jose, CA)
- Patent Classifications (CPCs):
-
C - CHEMISTRY C30 - CRYSTAL GROWTH C30B - SINGLE-CRYSTAL-GROWTH
H - ELECTRICITY H01 - BASIC ELECTRIC ELEMENTS H01L - SEMICONDUCTOR DEVICES
- DOE Contract Number:
- AC04-94AL85000
- Resource Type:
- Patent
- Country of Publication:
- United States
- Language:
- English
- Subject:
- heating; device; semiconductor; wafers; apparatus; heat; treating; disclosed; contains; assembly; light; energy; sources; emitting; wafer; particular; positioned; radial; zones; created; heated; instance; embodiment; form; spiral; configuration; alternative; appear; randomly; dispersed; respect; discernable; pattern; third; concentric; rings; tuning; placed; semiconductor wafers; heating device; concentric rings; light energy; energy sources; semiconductor wafer; light source; energy source; light sources; alternative embodiment; heat treating; spiral configuration; emitting light; /392/219/
Citation Formats
Vosen, Steven R. Heating device for semiconductor wafers. United States: N. p., 1999.
Web.
Vosen, Steven R. Heating device for semiconductor wafers. United States.
Vosen, Steven R. Fri .
"Heating device for semiconductor wafers". United States. https://www.osti.gov/servlets/purl/872418.
@article{osti_872418,
title = {Heating device for semiconductor wafers},
author = {Vosen, Steven R},
abstractNote = {An apparatus for heat treating semiconductor wafers is disclosed. The apparatus includes a heating device which contains an assembly of light energy sources for emitting light energy onto a wafer. In particular, the light energy sources are positioned such that many different radial heating zones are created on a wafer being heated. For instance, in one embodiment, the light energy sources form a spiral configuration. In an alternative embodiment, the light energy sources appear to be randomly dispersed with respect to each other so that no discernable pattern is present. In a third alternative embodiment of the present invention, the light energy sources form concentric rings. Tuning light sources are then placed in between the concentric rings of light.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {Fri Jan 01 00:00:00 EST 1999},
month = {Fri Jan 01 00:00:00 EST 1999}
}