Method for high-precision multi-layered thin film deposition for deep and extreme ultraviolet mirrors

Ruffner, Judith Alison

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Title: Method for high-precision multi-layered thin film deposition for deep and extreme ultraviolet mirrors

Abstract

A method for coating (flat or non-flat) optical substrates with high-reflectivity multi-layer coatings for use at Deep Ultra-Violet ("DUV") and Extreme Ultra-Violet ("EUV") wavelengths. The method results in a product with minimum feature sizes of less than 0.10-.mu.m for the shortest wavelength (13.4-nm). The present invention employs a computer-based modeling and deposition method to enable lateral and vertical thickness control by scanning the position of the substrate with respect to the sputter target during deposition. The thickness profile of the sputter targets is modeled before deposition and then an appropriate scanning algorithm is implemented to produce any desired, radially-symmetric thickness profile. The present invention offers the ability to predict and achieve a wide range of thickness profiles on flat or figured substrates, i.e., account for 1/R.sup.2 factor in a model, and the ability to predict and accommodate changes in deposition rate as a result of plasma geometry, i.e., over figured substrates.

Inventors:

Ruffner, Judith Alison ^[1]

Albuquerque, NM

Issue Date:: 1999-01-01

Research Org.:: Sandia National Laboratories (SNL), Albuquerque, NM, and Livermore, CA (United States)

OSTI Identifier:: 872327

Patent Number(s):: 5911858

Assignee:: Sandia Corporation (Albuquerque, NM)

Patent Classifications (CPCs):: C - CHEMISTRY C23 - COATING METALLIC MATERIAL C23C - COATING METALLIC MATERIAL

G - PHYSICS G02 - OPTICS G02B - OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS

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C - CHEMISTRY C23 - COATING METALLIC MATERIAL C23C - COATING METALLIC MATERIAL
C23C14/044 - {using masks to redistribute rather than totally prevent coating, e.g. producing thickness gradient}
C23C14/547 - {using optical methods}
C23C14/568 - {Transferring the substrates through a series of coating stations

G - PHYSICS G02 - OPTICS G02B - OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
G02B5/0891 - {Ultraviolet [UV] mirrors

G - PHYSICS G03 - PHOTOGRAPHY G03F - PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES
G03F7/70958 - {Optical materials and coatings, e.g. with particular transmittance, reflectance

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DOE Contract Number:: AC04-94AL85000

Resource Type:: Patent

Country of Publication:: United States

Language:: English

Subject:: method; high-precision; multi-layered; film; deposition; deep; extreme; ultraviolet; mirrors; coating; flat; non-flat; optical; substrates; high-reflectivity; multi-layer; coatings; ultra-violet; duv; euv; wavelengths; results; product; minimum; feature; sizes; 10-; shortest; wavelength; 13; 4-nm; employs; computer-based; modeling; enable; lateral; vertical; thickness; control; scanning; position; substrate; respect; sputter; target; profile; targets; modeled; appropriate; algorithm; implemented; produce; desired; radially-symmetric; offers; ability; predict; achieve; wide; range; profiles; figured; account; factor; model; accommodate; changes; rate; result; plasma; geometry; optical substrates; deposition method; film deposition; extreme ultraviolet; wide range; deposition rate; optical substrate; sputter target; sputter targets; method results; feature sizes; extreme ultra-violet; multi-layer coating; deep ultra-violet; /204/

Citation Formats


                    Ruffner, Judith Alison. Method for high-precision multi-layered thin film deposition for deep and extreme ultraviolet mirrors.  United States: N. p., 1999. 
        Web.

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                    Ruffner, Judith Alison. Method for high-precision multi-layered thin film deposition for deep and extreme ultraviolet mirrors.  United States.

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                    Ruffner, Judith Alison. Fri .  
        "Method for high-precision multi-layered thin film deposition for deep and extreme ultraviolet mirrors".  United States.  https://www.osti.gov/servlets/purl/872327.

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@article{osti_872327,

  title        = {Method for high-precision multi-layered thin film deposition for deep and extreme ultraviolet mirrors},

  author       = {Ruffner, Judith Alison},

  abstractNote = {A method for coating (flat or non-flat) optical substrates with high-reflectivity multi-layer coatings for use at Deep Ultra-Violet ("DUV") and Extreme Ultra-Violet ("EUV") wavelengths. The method results in a product with minimum feature sizes of less than 0.10-.mu.m for the shortest wavelength (13.4-nm). The present invention employs a computer-based modeling and deposition method to enable lateral and vertical thickness control by scanning the position of the substrate with respect to the sputter target during deposition. The thickness profile of the sputter targets is modeled before deposition and then an appropriate scanning algorithm is implemented to produce any desired, radially-symmetric thickness profile. The present invention offers the ability to predict and achieve a wide range of thickness profiles on flat or figured substrates, i.e., account for 1/R.sup.2 factor in a model, and the ability to predict and accommodate changes in deposition rate as a result of plasma geometry, i.e., over figured substrates.},

  doi          = {},

  journal      = {},
number       = ,

  volume       = ,

  place        = {United States},

  year         = {1999},

  month        = {1}

}

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Works referenced in this record:

The scattering of x rays from nonideal multilayer structures
journal, January 1989

Stearns, D. G.
Journal of Applied Physics, Vol. 65, Issue 2
https://doi.org/10.1063/1.343131

Determination Of Thickness Errors And Boundary Roughness From The Measured Performance Of A Multilayer Coating
journal, August 1986

Spiller, Eberhard
Optical Engineering, Vol. 25, Issue 8
https://doi.org/10.1117/12.7973935

Interface imperfections in metal/Si multilayers
journal, March 1992

Windt, D. L.; Hull, R.; Waskiewicz, W. K.
Journal of Applied Physics, Vol. 71, Issue 6
https://doi.org/10.1063/1.351040

Light-induced dry etching of semiconductors in the vacuum ultraviolet
conference, June 1998

Streller, Udo; Raaf, Heribert; Schwentner, Nikolaus
Optoelectronics and High-Power Lasers & Applications, SPIE Proceedings
https://doi.org/10.1117/12.309501

Near perfect optics
report, June 1996

Goeke, R.; Farnsworth, A. V.; Neumann, C. C.
https://doi.org/10.2172/251600

Fabrication of high‐reflectance Mo–Si multilayer mirrors by planar‐magnetron sputtering
journal, September 1991

Stearns, D. G.; Rosen, R. S.; Vernon, S. P.
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, Vol. 9, Issue 5
https://doi.org/10.1116/1.577221

XUV optical constants of single-crystal GaAs and sputtered C, Si, Cr_3C_2, Mo, and W
journal, January 1991

Windt, David L.
Applied Optics, Vol. 30, Issue 1
https://doi.org/10.1364/AO.30.000015

Computer search for layer materials that maximize the reflectivity of X-ray multilayers
journal, January 1988

Rosenbluth, A. E.
Revue de Physique Appliquée, Vol. 23, Issue 10
https://doi.org/10.1051/rphysap:0198800230100159900

Multilayer facilities required for extreme-ultraviolet lithography
journal, November 1994

Windt, D. L.
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, Vol. 12, Issue 6
https://doi.org/10.1116/1.587449

Low‐Loss Reflection Coatings Using Absorbing Materials
journal, May 1972

Spiller, Eberhard
Applied Physics Letters, Vol. 20, Issue 9
https://doi.org/10.1063/1.1654189

Multilayer mirror technology for soft-x-ray projection lithography
journal, January 1993

Stearns, D. G.; Rosen, R. S.; Vernon, S. P.
Applied Optics, Vol. 32, Issue 34
https://doi.org/10.1364/AO.32.006952

Extreme ultraviolet lithography for circuit fabrication at 0.1-μm feature size
conference, September 1995

Tichenor, Daniel A.; Kubiak, Glenn D.; Stulen, Richard H.
SPIE's 1995 International Symposium on Optical Science, Engineering, and Instrumentation, SPIE Proceedings
https://doi.org/10.1117/12.220978

Semiconductor lithography for the next millennium
journal, April 1996

Geppert, L.
IEEE Spectrum, Vol. 33, Issue 4
https://doi.org/10.1109/6.486632

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Similar Records

Title: Method for high-precision multi-layered thin film deposition for deep and extreme ultraviolet mirrors

Abstract

Citation Formats

The scattering of x rays from nonideal multilayer structures journal, January 1989

Determination Of Thickness Errors And Boundary Roughness From The Measured Performance Of A Multilayer Coating journal, August 1986

Interface imperfections in metal/Si multilayers journal, March 1992

Light-induced dry etching of semiconductors in the vacuum ultraviolet conference, June 1998

Near perfect optics report, June 1996

Fabrication of high‐reflectance Mo–Si multilayer mirrors by planar‐magnetron sputtering journal, September 1991

XUV optical constants of single-crystal GaAs and sputtered C, Si, Cr_3C_2, Mo, and W journal, January 1991

Computer search for layer materials that maximize the reflectivity of X-ray multilayers journal, January 1988

Multilayer facilities required for extreme-ultraviolet lithography journal, November 1994

Low‐Loss Reflection Coatings Using Absorbing Materials journal, May 1972

Multilayer mirror technology for soft-x-ray projection lithography journal, January 1993

Extreme ultraviolet lithography for circuit fabrication at 0.1-μm feature size conference, September 1995

Semiconductor lithography for the next millennium journal, April 1996

The scattering of x rays from nonideal multilayer structures
journal, January 1989

Determination Of Thickness Errors And Boundary Roughness From The Measured Performance Of A Multilayer Coating
journal, August 1986

Interface imperfections in metal/Si multilayers
journal, March 1992

Light-induced dry etching of semiconductors in the vacuum ultraviolet
conference, June 1998

Near perfect optics
report, June 1996

Fabrication of high‐reflectance Mo–Si multilayer mirrors by planar‐magnetron sputtering
journal, September 1991

XUV optical constants of single-crystal GaAs and sputtered C, Si, Cr_3C_2, Mo, and W
journal, January 1991

Computer search for layer materials that maximize the reflectivity of X-ray multilayers
journal, January 1988

Multilayer facilities required for extreme-ultraviolet lithography
journal, November 1994

Low‐Loss Reflection Coatings Using Absorbing Materials
journal, May 1972

Multilayer mirror technology for soft-x-ray projection lithography
journal, January 1993

Extreme ultraviolet lithography for circuit fabrication at 0.1-μm feature size
conference, September 1995

Semiconductor lithography for the next millennium
journal, April 1996